二零一四年台灣平坦化論壇2014 CMP Forum Taiwan
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Transcript 二零一四年台灣平坦化論壇2014 CMP Forum Taiwan
二零一四年台灣平坦化論壇
2014 CMP Forum Taiwan
0830~1200 AM, September 5, 2014
台北市南港區經貿二路1號世貿南港展覽館 402C會議室
Taipei World Trade Center Nangang Exhibition Hall Rm 402C
平坦化現在以及超越摩爾
定律後的角色
THE ROLE OF CMP NOW
AND BEYOND MOORE’S LAW
主辦單位
Organized by
協辦單位
Co-Organized by
執行單位
Executed by
贊助單位
Sponsored by
收費 Price
By 8/21
8/22~9/1
9/5 walk-in
CMPUGTW board members
Free
Free
TWD 200
CMPUGTW members
TWD 600
TWD 900
TWD 1000
Non-member
TWD 900
USD 30
TWD 1000
USD 35
TWD 1200
USD 40
08:30–08:50
Registration, sign up
08:50-09:00
Opening Remarks: Professor Arthur Chen, National Taiwan University of Science
and Technology; Chairman of Board Directors of CMPUGTW.
09:00-10:00
Session 1. Moderator: TBD
09:00-09:30
Challenges in 1x Design Node
Semiconductor Device Cleaning
Professor Jingoo Park
Hanyang University
09:30-10:00
CMP Applications from Nanometer
Scale Features to Microscopic Levels
Dr. Yuchun Wang, Vice
President of R&D
Anji Microelectronics
(Shanghai) Co., Ltd.
10:00-10:20
Break
10:20-12:00
Session 2. Moderator: TBD
The Next Generation Filtration of CMP
Slurry with Nanofiber Technology
HJ Yang, Director of
Application
Development
Entegris
10:50-11:20
CMP Solutions for 1X Technology
Nodes
Dr. Marty DeGroot,
Asia Technology
Director
Dow Electronic
Materials
11:20-11:50
Topic: TBD
Speaker: TBD
11:50-12:00
Open discussion
10:20-10:50
12:00
VIP lunch (invited only)
Programs are subject to change without prior notice