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指導老師：王聖璋 博士
專題生：林仕章
2012/03/13
結果與討論
(a) SEM micrographs of quartz master mold containing various positive patterns of 300 nm to 2 mm, (b) SEM micrographs
of replicated PDMS replica by nano-molding technique. The PDMS replica contains various positive patterns of 300 nm to 2
mm, and (c) cross-sectional SEM micrograph of PDMS replica.
結果與討論
(c) AFM micrograph of Au nano-pattern on bare Si substrate. About 50 nm thick Au layer was transferred from PDMS
mold to Si substrate, (d)photograph of 150 mm diameter PDMS mold, fabricated by nano-molding technique and
containing various sized nano-patterns by nano-molding, and (e) photograph of Au nano-patterns on 150 mm diameter
Si wafer by simplified nano-transfer printing process
結果與討論
(a) Schematic of nano-transfer printing on non-planar glass substrate and (b)photograph and
SEMmicrographs of Au nano-patterns on non-planar glass substrate.
結果與討論
Photograph and SEM micrographs of Au nano-patterns on flexible PET film
結論
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使用簡單的奈米轉印過程，大面積的金的奈米圖案是
可以轉印到不同的基材上，例如：Si wafer, non-planar
glass lens and flexible PET film。
沒有塗佈SAM，可以從PDMS模上的金圖案，轉印到
基材上大約為50nm厚的圖案。
金層和基材在化學反應時所生成的OH自由基對奈米轉
印過程是無裂縫的。
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