技術研討資料 The Basic Concept of the Gas Filter 需求再造 創新需求

Download Report

Transcript 技術研討資料 The Basic Concept of the Gas Filter 需求再造 創新需求

創新需求需求再造
The Basic Concept of the Gas Filter
技術研討資料
主講人 : 龍仁生
創新需求需求再造
Content








How do gas filters work ?
Basic requirements of gas filter
Filter material comparison
Filter lifetime recommendation
Case study
How to choose a suitable filter ?
Filter technology trend
Summary
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
How do Gas Filters Work

Particle capture mechanisms
 Impaction
 Interception
 Diffusion
 Electrostatic

MPPS (Most Penetrating Particle Size)

Nature of gas
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
How do Gas Filters Work
Electrostatic
Deposition
Fluid
Inertial Diffusion
Streamlines
Impaction
Gravitational
Settling
Interception
Fiber
Cross
Section
Mykrolis
MILLIPORE
台灣分公司‧微電子事業處
創新需求需求再造
10
Capture by
Interception
-2
10 -4
Capture by
Diffusion
10 -6
Combines
Capture by
Interception
and
Diffusion
Fractional Penetration
10 -8
10 -10
10
-12
10 -14
10 -16
Most
Penetrating
Particle Size
at 50 cm sec.
10 -18
10 -20
10 -22
Theoretical Plot
illustrating the Most
Penetrating Particle
Size Concept

10 -24
10 -26
10 -28
.01
.02 .03 .06 .1
.2
Particle Diameter, m
.3
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
Particle Capture on
Nickel Membrane
3m
Particles
Mykrolis
台灣分公司‧微電子事業處
MILLIPORE
創新需求需求再造
Log Reduction Value

LRV = Log10 (inlet Cp / outlet Cp)

Example:
– Inlet
Cp = 1 x 10^6 particles / ft3
– Outlet Cp = 1 particle / ft3
– LRV = 6
– 99.9999% efficient
– fractional penetration = 1 x10^-6
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
Basic requirements of gas filter
High retention
- The ability to retain all particles,down to the smallest size.
 Downstream cleanliness

- The ability not to add anything ( particles or volatiles (moisture,
others))to the gas stream.

High corrosion resistance
- The ability

to withstand in a corrosive environment.
Fast gas displacement
- The ability to displace gas quickly.
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
Filter Membrane Comparison
Materials
Of
Membrane
Shedding
Retention
(LRV)
Outgasing
Gas
Displacement
Corrosion
Resistance
Nickel
Excellent
>10.8
Excellent
Excellent
Good
SUS316L
Excellent
6.2
Good
Excellent
Fair
PTFE
Good
>10.8
Poor
Poor
N/A
Ceramic
Fair
7.8
Fair
Poor
N/A
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
Filters Lifetime Recommendation
• Specialty Gas (Cl2, HBr, SiH4, DCS…)
< 2 Years
• Inert Gas (N2, H2, O2, He…)
< 5 Years
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
• No.1 Upstream
SEM and EDS
• No.2 Upstream
SEM and EDS
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
• No.1 downstream
SEM and EDS
• No.2 downstream
SEM and EDS
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
• No.1 Housing SEM
and EDS (corroded)
• No.2 Housing SEM
and EDS (corroded)
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
How to Choose a Suitable Filter
• Compatibility (Corrosive / Inert)
Corrosive: Ni / PTFE
Inert : Ni / PTFE / SS
• Retention
Ni / PTFE > SS
• Gas flow rate in need
• Considering Inlet pressure
• Fitting (VCR, Swaglok, Butt weld, IGS(Surface
Mount))
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
Filter Technology Trend
• Improve Process uptime & Wafer defects.
• Overall Process control: Particles, Moisture,
Oxygen,Impurity…etc.
• Our best suggestion is both of Filter & Purifier
can improve process uptime & overcome wafer
defects.
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
The Role of Purifier
• Purifier play a role of remove impurities
(Oxygen, Moisture,CO2…etc)
• Moisture is one factor cause corrosion on
component & piping to process
chamber.(Especially, Corrosive gas)
• Moisture & Impurity can affect the process
uptime & wafer defects.
Mykrolis
台灣分公司‧微電子事業處
創新需求需求再造
Summary





Gas filter key filtrate mechanism : diffusion &
interception
Cleanliness becomes most important
All-Metal gas filters are the technology trend
Routine filter change out is the key to high
quality particle performance
Purifier can enhance gas filter performance
and lifetime
Mykrolis
台灣分公司‧微電子事業處