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Status of DSSD Sensors Thomas Bergauer (HEPHY Vienna) Belle-II Meeting Nov 09 19. Nov. 2009 Overview • Prototype DSSDs have been ordered at – Hamamatsu (rectangular shape) – Micron Semiconductor (wedge shape) • I will present status of both orders 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 2 20 [cm] 10 SVD Layout layers 4 6 6 5 4 4 6 4 6 Layer 6 -20 4 6 4 6 -10 4 6 4 6 4 6 6 6 3 0 -30 4 6 4 6 4 6 4 6 6 6 0 10 20 30 40 [cm] # Rect. Rect. Wedge APVs 2 (122.8 x 38.4 mm , 160 /Sensors 50 um pitch) LaddersRectSensors Sensors 2 z APVs Rect (122.8 mm , 240 / 75 um pitch) rphi APVs [50μm] x 57.6[75μm] z APVs rphi APVs z APVs rphi APVs 17 2 Wedge (122.8 x 57.6-38.4 mm 0 68 , 240 / 75..50 17 um pitch) 850 5 14 0 42 14 560 4 10 0 20 10 300 3 8 16 0 0 192 49 16 130 41 1902 Sum: 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 3 Hamamatsu Order RECTANGULAR SENSORS 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 4 Hamamatsu Status • HPK decided to re-start DSSD production – Not only for Belle. They have been pushed also from other interested (Japanese) parties • KEK was in contact with Japanese sales representative and engineer • Beginning of Oct. 2009: Mask Production – Unfortunately without the possibility to add test structures • Delivery: March 2010 (<=30pcs.) 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 5 Rectangular DSSD Layout • Overall Size: – 124.88 x 59.6 mm • P-side – 768 long readout strips – 75 micron readout pitch – 37.5 micron strip pitch (one intermediate strip) – Second row of bonding pads compatible to Origami bonding scheme • N-side – 512 short readout strips – 240 micron readout pitch – 120 micron strip pitch (one intermediate strip) 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 6 Rectangular DSSD Specifications 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 7 Micron Order WEDGE SENSORS 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 8 Micron Semiconductor Ltd. • Company in Sussex, England, founded 1983 • Contact persons: – Colin Wilburn (Director) – Susan Walsh (Designer) • Financial: Item Quantity Masks Unit Price 16 2,200 35,200 1 1,800 1,800 DSSDs 10 2,000 20,000 Shipping boxes 10 200 2,000 5 200 1,000 Probe card Shipments Sum € 19. Nov. 2009 Sub Total Thomas Bergauer (HEPHY Vienna) 60,000 (eq. 8M¥) 9 Wedge DSSD specifications • • • • • • Resistivity: 8 kΩcm (n-type); crystal orientation <100> Thickness: 300 +/- 10 microns Full Depletion (FD): 40 volts typical; 70 volts maximum Operating Voltage: FD to 2x FD Minimum Breakdown Voltage (10uA): 2.5x FD Total drain leakage current (20 degrees C): 2uA typical; 10uA maximum (at 50% rH) • Polysilicon resistor 15 +/- 5 megohms • Coupling capacitor > 1.2 pF / cm strip length and per microstrip width (100pF typical) • Interstrip resistance 100MΩ min, 1 GΩ ohm typical (P-Side); 10 MΩ min, 100MΩ typical (N-side) 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 10 Micron Wafer Layout (to be confirmed) Quadratic baby sensors 2,3,4 p-side: 512 strips 50 µm pitch 1 interm. strip n-side: 256 strips 100 µm pitch 0 interm. strip different p-stop patterns 1) atoll p-stop varying distance from strip 3 different GCDs for the n-side Main sensor p-side: 768 strips 75-50 µm pitch 1 interm. strip n-side: 512 strips 240 µm pitch 1 interm. strip combined p-stop 2) conventional p-stop varying width 3) combined p-stop varying distance from strip Teststructures for p-side Baby sensor 1 p-side: 512 strips 50 µm pitch 1 interm. strip n-side: 512 strips 100 µm pitch 1 interm. strip atoll p-stop Teststructures for n-side (no GCD) 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 11 Open Points: Guard Ring Design • We proposed single guard ring with outer n-ring (n_sub) similar to HPK design – 800 micron size • Micron wants to implement their own multi-guard ring design – – – – 19. Nov. 2009 Three guard rings 1000 micron size Requires NDA signed by us They do not like n_sub implant; however, this make IV tests more complicated Thomas Bergauer (HEPHY Vienna) 12 Open Points: p-stop layout combined p-stops connected p-stops isolated 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 13 Micron Wafer Layout (to be confirmed) Quadratic baby sensors 2,3,4 p-side: 512 strips 50 µm pitch 1 interm. strip n-side: 256 strips 100 µm pitch 0 interm. strip different p-stop patterns 1) atoll p-stop varying distance from strip 3 different GCDs for the n-side Main sensor p-side: 768 strips 75-50 µm pitch 1 interm. strip n-side: 512 strips 240 µm pitch 1 interm. strip combined p-stop 2) conventional p-stop varying width 3) combined p-stop varying distance from strip Teststructures for p-side Baby sensor 1 p-side: 512 strips 50 µm pitch 1 interm. strip n-side: 512 strips 100 µm pitch 1 interm. strip atoll p-stop 1) 2) Teststructures for n-side (no GCD) 3) 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 14 Micron Wedge DSSD - Summary [µm] number pitch Implant width AL width AC pad DC Pad Remarks P strip (readout) 768 75 – 50 14 20 50 x 200 42 x 108 AC pads: 2 rows, staggered DC pads: 1 row, staggered N strip (readout) 512 240 30 40 260 x 60 180 x 60 AC pads: 2 rows, not staggered DC pads: 1 row, not staggered Bias ring 1 75 95 MGR 3 tbd. tbd. Edge ring 1 tbd. tbd. • • dicing edge One intermediate strip on both p-side and n-side Outer dimensions: – Width on top: – Width on bottom: – Length: • symmetric 60.15 ± 0.05 mm 40.60 ± 0.05 mm 125.11 ± 0.05 mm Note: all dimension values are preliminary, i.e. they are subject to discussion and are awaiting final confirmation by Micron! 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 15 Schedule • Most urgent: agree on open points with Micron to start production as fast as possible • Wait for delivery – Hamamatsu: end of March 2010 – Micron: Summer 2010 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 16 Future next steps with prototype DSSDs • Electrical Characterization in Vienna • Build Origami module with HPK sensors • Build full ladder comprising – several Origami modules – slanted module with Micron sensor • Testbeam in autumn 2010 at CERN • Irradiation tests of sensors – Together with electronics? – Where? When? 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 17 THE END. 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 18 P-Side, AC and DC pads Marker with 10 µm diameter (easily adjustable) on every 128th AC pad AC pads: 50 x 200 µm, 2 staggered rows DC pads: 42 x 108 µm 1 staggered row • As long as the pad pitch within each row is constant, different pitches in different pad rows do not cause problems for bonding. 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 19 N-Side, P-Stop pattern (implants only) Individual P-Stop atoll N+ implant of strip Additional P-Stop „strip“ splitting the accumulation layer • According to Y. Iwata et al., this “combined pattern” performs best for a tradeoff between charge collection efficiency and interstrip capacitance. 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 20 N-Side, AC and DC pads • • AC pad size: 260 x 60 µm, marker on every 128th pad, 2 rows, no staggering DC pad size: 180 x 60 µm, 1 row, no staggering 19. Nov. 2009 Thomas Bergauer (HEPHY Vienna) 21