Transcript T28-A
8吋高密度電漿輔助化學氣相沉積
系統(HDPCVD)簡介
System Configuration
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1. System Maker : Applied Materials.Inc
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2. System Model : Centura 5200
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3. Serial Number : 35605-03
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4. Mainframe : Ultima HDP MF w/Multi-Slot
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5. Load Lock : Nerrow Body
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6. Wafer Size : 200mm SNNF
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7. Chamber Type & Quantity : Chamber : A =Ultima Plus
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Chamber : D = DxZ
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8. Other Chambers : Ch#E (MSCD) Ch#F Orienter
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9. RF Generator : ETO Generator, RFG-2000-2V
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10. RPC : MKS - AX7670
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11. Robot Type : HP Robot
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12. Turbo Pump : EBARA – ET1600W
PROCESS DATA
Chamber “A” HDP (HDP 1.0K), Temperature < 400 ℃
Depo Rate
Recipe
D/T
T/V
step
RF
(TOP)
RF
(SIDE)
RF
(BIAS)
Temp
AR
AR-T
O2
SIH4
SIH4-T
HDP-1.0K-R
9.5”
1100
1000w
3400w
2900w
400℃
120
16
133
62
10.6
Item
1
2
3
4
5
6
7
8
9
Thickness
1114
1025
1043
1025
1010
1033
1094
1007
1060
AVG
Range
Unif.%
Depo rate.
N
GOF
1046Å
107 Å
3.533
6600Å/min
1.452
98.86%
PROCESS DATA
Chamber “D” DxZ (PE-SiO2 1.0K)
Depo Rate
Chamber “D” DXZ ( PE-OX-1.0K )
Recipe
D/T
Servo
HFRF
Temp
Spacing
SIH4
N2O
PE-OX-1.0K-R
8.7”
2.7 Torr
270w
400℃
550mils
68
2000
Item
1
2
3
4
5
6
7
8
9
Thickness
1011
1016
1024
1012
1031
1011
1022
1012
1065
AVG
Range
Unif.%
Depo rate
N
GOF
1023 Å
54 Å
1.689
7055Å/min
1.461
99.33 %
Results
Chamber D
高沈積率
製程腔體
Real
required
7055Å/min
>2000Å/min
PROCESS DATA
Chamber “D” DxZ (PE-SiN 1.0K)
Depo Rate
Chamber “D” DXZ ( PE-NIT-1.0K-R )
Recipe
D/T
Servo
HFRF
Temp
Spacing
SIH4
N2
NH3
PE-NIT-1.0K-R
7.1”
4.9Torr
620w
400℃
700mils
220
4000
120
Item
Thickness
1
2
3
4
5
6
7
8
9
1012
999
1004
1020
1027
1006
1018
990
1010
AVG
Range
Unif.%
Depo rate
N
GOF
1010
37
1.13
8552Å/min
2.02
99.8
Results
Chamber D
高沈積率
製程腔體
Real
required
8552Å/min
>2000Å/min