Transcript Making Uniform Thin Films Brigham Young University

Making Uniform Thin
Films
Brett Bostrom, Dr. R. Steven Turley, Dr. David Allred
Brigham Young University
“The Skinny”
No one universal reflector for XUV
Changing thickness changes behavior
(Γ = 2ndcosβ)
Uniformity is crucial!
1 – 100 nm
Thin Film
𝑛1
𝑛2
Substrate (Silicon Wafer, Glass, etc.)
The Process of Deposition
Different methods for deposition
Thermal Evaporation
Magnetron Sputtering
Stage
Substrate
Metal Atoms
+ Ar ions
+ Ar ions
Target
Magnet
_
High-Voltage Power Supply
Complications
 High Vacuum
 Oxidation
 Uniformity
Magnetic field
Reducing Thickness Variance
Stepper Motor
Planetary Gears
Multiple revolutions
 Steps to
degrees
 Revolutions
 Initial/Final
positions
Target
Stage
Expected Results
Automated system
More Consistent results
More Uniform films
Comparison
Stationary
Revolution only
Planetary motion
Acknowledgments
 Dr. Turley
 Dr. Allred
 John Ellsworth
 Chris Cosio
 James Vaterlaus