Surface Passivation of Crystalline Silicon Solar Cells: A Review
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Transcript Surface Passivation of Crystalline Silicon Solar Cells: A Review
Surface Passivation of Crystalline
Silicon Solar Cells: A Review
Armin G. Aberle
Progress in Photovoltaics: Research and
Application 8,473-487,2000.
Outline
Introduction
Fundamental physics
Surface passivation method
Surface passivation of c-Si solar cells
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Introduction
Defects
Extrinsic (Processing related)
Intrinsic (Si related, unavoidable)
Dangling bond
Growth condition
Dislocation
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Surface type in Si solar cell
Metalized
Finger and bus bar
Very high surface recombination
Avoid recombination loss
Non-metalized
Illuminated region
Well passivated and good blue response
Avoid highly doped
Back electrode
high surface recombination
Avoid recombination loss
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Surface recombination
Shockley-Read-Hall (SRH) theory
Surface
Recombination
rate:
Ec
Et
Ev
Low recombination rate strategy
1. low surface state Nst
2. low carrier concentration ns, ps
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Reduction of the surface states
Growth/deposition of a dielectric film
SiO2
Al2O3
d
SiNx
4n
Antireflective coating layer
Dielectric layer(d)
Si solar cell
Chemical methods
HF immersion
Alcoholic solution
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Field-effect passivated
High-low junction
p+-p
n+-n
Back surface field (BSF)
Front surface field (FSF)
p-n junction
MIS
Selective emitter
HIT(a-Si)
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Combined passivaction
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Concept
Al2O3
+
+
+
+
+
+
-
e-
h+
The fixed charge induced the negative charge on the surface,
bending the band diagram.
Al2O3 is suitable to p-type Si substrate.
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PERL solar cells
Passivated Emitter and Rear Locally Diffused Solar Cell
(24.7%)
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Band offset measurement
The Si substrate can passivated by dielectric film and electric
field effect method.
The Al2O3 is suitable for p-type Si substrate passivation, and
the SiNx is suitable for n-type Si substrate passivation.
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Thanks for your attention!!