Introduction to MOS Transistors Section 6.1-6.4 Selected Figures in Chapter 15 Outline • • • • Review of NMOS Introduction of PMOS Application of CMOS in Digital Circuits Small Signal Model.
Download ReportTranscript Introduction to MOS Transistors Section 6.1-6.4 Selected Figures in Chapter 15 Outline • • • • Review of NMOS Introduction of PMOS Application of CMOS in Digital Circuits Small Signal Model.
Introduction to MOS Transistors Section 6.1-6.4 Selected Figures in Chapter 15 Outline • • • • Review of NMOS Introduction of PMOS Application of CMOS in Digital Circuits Small Signal Model Introductory Device Physics A Crude Metal Oxide Semiconductor (MOS) Device P-Type Silicon is slightly conductive. The gate draws no current! Positive charge attract negative charges to the interface between insulator and silicon. V2 causes movement of negative charges, thus current. V1 can control the A conductive path is created resistivity of the channel. If the density of electrons is sufficiently high. Q=CV. Typical Dimensions of MOSFETs tox is made really thin to increase C, therefore, create a strong control of Q by V. These diode must be reversed biased. A Closer Look at the Channel Formulation Need to tie substrate to GND to avoid current through PN diode. (OFF) (ON) VTH=300mV to 500 mV Free electrons appear at VG=VTH. Positive charges repel the holes creating a depletion region, a region free of holes. VG-VD is sufficiently large to produce a channel No channel VG-VD is NOT sufficiently large to produce a channel Electrons are swept by E to drain. Drain can no longer affect the drain current! Regions (No Dependence on VDS) No channel Assumption: Graphical Illustration Determination of Region TYPO: ON Determine Region of Operation (6.19) Tricky! Assume that VTHN=0.4 V and VTHP=-0.4 V PMOS in Cut-Off Mode ---------- P+ P+ N+ N P Substrate= 0V PMOS: Formation of Channel ---------- P+ ++++++++++ P+ N+ N P Substrate= 0V Induced holes PMOS in Triode Region ------ -- P+ +++++++++ P+ N+ N P Substrate= 0V Induced holes PMOS in Saturation Region ----- -- P+ ++++++++ P+ N+ N P Substrate= 0V Induced holes PMOS Transistor Determine Region of Operation (6.40) Assume that VTHN=0.4 V and VTHP=-0.4 V NMOS Inverter VGS=VCC, Switch is ON. VGS=0 V, Switch is OFF. PMOS Inverter VSG=VCC, switch is off. VSG=0, switch is on. Mysterious 2-Input Logic Gate Exercise In Class NAND Gate Small Signal Model Limited VDS Dependence In Saturation As VDS increase, effective L decreases, therefore, ID increases. Pronounced Channel Length Modulation in small L Similarity to Early Effect A larger reverse bias voltage leads to a larger BC depletion region. The effective base width (WB) is reduced. The slope of the electron profile increases. IC increases as VCE is increased. Output Resistance ro 1 I D Transconductance • As a voltage-controlled current source, a MOS transistor can be characterized by its transconductance: • It is important to know that Compare NMOS Equation to PMOS Equation (Cut-off) (triode) Valid for NMOS (saturation) (saturation) (triode) (Cut-off) Valid for PMOS Small Signal Model for Both BJT AND CMOS Exercise Slides Determine Region of Operation (6.19) Tricky! Assume that VTHN=0.4 V and VTHP=-0.4 V Determine Region of Operation (6.40) Assume that VTHN=0.4 V and VTHP=-0.4 V NMOS Inverter VGS=VCC, Switch is ON. VGS=0 V, Switch is OFF. PMOS Inverter VSG=VCC, switch is off. VSG=0, switch is on. Mysterious 2-Input Logic Gate Exercise In Class Optional Slides VA=5 V VA=0 V