Micro MEsh GASeous Detectors (MicroMegas) RD51 Electronics school CERN 3 – 5 February 2014

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Transcript Micro MEsh GASeous Detectors (MicroMegas) RD51 Electronics school CERN 3 – 5 February 2014

Micro MEsh GASeous
Detectors
(MicroMegas)
RD51 Electronics school
CERN 3 – 5 February 2014
What are Micromegas ?
 Micromegas are parallel-plate
chambers where the amplification
takes place in a thin gap, separated
from the conversion region by a
fine metallic mesh
 The thin amplification gap (short
drift times and fast absorption of
the positive ions) makes it
particularly suited for high-rate
applications
-800 V
Conversion & drift space
(few mm)
-550 V
Mesh
Amplification
Gap 128 µm
The principle of operation
of a MicroMegas chamber
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The bulk MicroMegas technique
Drift
UV
5 mm
Pillars (Ø ~300μm)
Mask
128 µm
250 µm
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150 µm
PCB
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Bulk MicroMegas structure
Standard configuration
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Pillars every 5 (or 10) mm
Pillar diameter ≈350 µm
Dead area ≈1.5 (0.4)%
Amplification gap 128 µm
Mesh: 325 lines/inch
Pillar distance on photo: 2.5 mm
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MicroMegas as μTPC
µ
HV = -850 V
HV = -550 V
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Operating parameters
 Chambers are operating with an Ar:CO2 (93:7) gas mixture
(same gas as MDTs, safe and cheap, no flammable
components)
 High Voltage (moderate HV requirements)
 Mesh: -500 V (amplification field 40-50 kV/cm)
 Drift-electrode: -800 V (~600 V/cm)
 Currents in nA range
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Performance requirements
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Spatial resolution: ~60 m
Angular resolution:~0.3 mrad
Good double track resolution
Trigger capability
Efficiency: > 98%
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Sparks in the chamber
Mesh support pillars
Mesh
PCB
Read-out strip
Sparks between mesh and readout strips may damage the detector and
readout electronics and/or lead to large dead times as a result of HV
breakdown
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Resistive MicroMegas chambers
To avoid spark effect the readout strips were covered with the 64 µm thick
insulator layer with resistive strips on top of it connected to the +HV via
discharge resistor and mesh is connected to GND
Resistive characteristics
of the chambers
Resistive strip
0.5-5 MΩ/cm
PCB
Read-out strip
CHAMBER
R11
R12
R13
HV resistor
(MΩ)
15
45
20
2
5
0.5
Insulator
Resistance
along strip
(MΩ/cm)
+500V
Embedded resistor
15-45 MΩ 5mm long
PCB
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Read-out strip
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Resistive MicroMegas chambers
-300V
First 2D chambers with the “spark protection” resistive strips
R16, R17, R18
5 mm
Pitch: all strips – 250 µm;
Width: resistive – 60 µm
Y-strips – 100 µm
X-strips – 200 µm
+500V
GND
128 µm
Y-strips
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X-strips
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Standard chamber vs resistive
MicroMegas mesh currents and HV drop
in neutron beam
Gas: Ar:CO2 (85:15)
Standard MM:
Large currents
Large HV drops, recovery time O(1s)
Chamber could not be operated stably
Neutron flux: ≈ 106 n/cm2/sec
R11:
Low currents
Despite discharges, but no HV drop
Chamber operated stably up to max HV
HV values
Mesh currents
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Spark signals resistive vs standard
Sparks measured directly on readout strips through 50 Ohm
Several spark signals plotted on top of each other to enhance the overall
characteristics
10 µs
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-600
-400
-200
0
R12 shows 2-3 order of magnitude less signal and shorter recovery time
than standard MM
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Equivalent scheme of resistive
MicroMegas chambers
-HV
Mesh
C2
C1
Induced charge
Resistive strip
C3
Copper strip
R1
Amp
CA
C4
C1 – capacitance Mesh to ground
C2 – capacitance R-strip to ground
C3 – capacitance R-strip to readout strip
C4 – capacitance readout strip to ground
CA – input capacitance of preamplifier
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