Transcript Document

M. Meyyappan
Director, Center for Nanotechnology
NASA Ames Research Center
Moffett Field, CA 94035
email: [email protected]
web: http://www.ipt.arc.nasa.gov
Guest Lecturer: Dr. Geetha Dholakia
Nanoscale Imaging Tools
Overview of microscopy
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Optical Microscope
Electron Microscopes
Transmission electron microscope
Scanning electron microscope
Scanning probe microscopes
Scanning tunneling microscope
Atomic force microscope
NOTE: This talk has been put together from material available
in books, various websites, and from data obtained by NASA
nanotech group. I have given acknowledgements where ever
possible.
OPTICAL MICROSCOPES
Image construction for a simple biconvex lens
Important parameters
• Magnification: Image size/Object size
• Resolution: Minimum distance between two
objects that can still be distinguished by the
microscope.
Schematic of a simple optical microscope
Total visual magnification
MOBJ X MEYE
www.microscopy.fsu.edu
Rayleigh criterion for resolution
Δx ~ 0.2μ
www.microscopy.fsu.edu ; www.imb-jena.de
Please check the first web site to watch a Java Applet on the dependence of Rayleigh criterion on  of incident
radiation and on the numerical aperture.
THE ELECTRON MICROSCOPES
de Broglie : λ = h / mv
λ: wavelength associated with the particle
h: Plank’s constant 6.63 10^-34 J.s;
mv: momentum of the particle
m_e: 9.1 10^-31 kg; e 1.6 10^-19 coloumb
P.E eV = mv2/2 => λ = 12.3/VÅ
V of 60kV, λ= 0.05 Å => Δx ~ 2.5 Å
Microscopes using electrons as illuminating radiation
TEM & SEM
Components of the TEM
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Electron Gun: Filament, Anode/Cathode
Condenser lens system and its apertures
Specimen chamber
Objective lens and apertures
Projective lens system and apertures
Correctional facilities (Chromatic, Spherical, Astigmatism)
Desk consol with CRTs and camera
Transformers: 20-100 kV; Vacuum pumps: 10-6 – 10-10 Torr
Schematic of E Gun & EM lens
Magnification: 10,000 – 100,000; Resolution: 1 nm-0.2 nm
www.udel.edu
TEM IMAGES
www.udel.edu ; www.nano-lab. com ; www.thermo.com
Schematic of SEM
Physics dept, Chalmers university teaching material
Electron scattering from specimen
www.unl.edu
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Resolution depends on spot size
Typically a few nanometers
Topographic scan range: order of mm X mm
X rays: elemental analysis
Some SEM images
CNT in an array
Blood platelet
Dia: 7
CNT: NASA nanotech group; Blood
cell: www. uq.edu. au
Scanning probe microscopy
• 1982 Binning & Rohrer, IBM
Zurich.
• STM, AFM & Family.
• Resolution:
Height: 0.01nm, XY: 0.1nm
• Local tip-sample interaction:
Tunneling (electronic structure),
Van der Waal’s force,
Electric/Magnetic fields.
• Advantages: atomic resolution,
non destructive imaging, UHV,
ambient/liquids, temperatures.
• Diverse fields: materials
science, biology, chemistry,
tribology.
www.spm.phy.bris.ac.uk
Scanning tunneling microscope
I  e-2d
I: Tunneling current;  (decay const.) =  2m/ h
d: tip-sample distance
www.mpi-halle.mpg.de ; spm.aif.ncsu.edu
Operational modes and requirements
• Topography (conducting
surfaces and biological
samples).
• Vibration isolation: 0.001nm
• ST Spectroscopy (from IV
obtain the DOS).
• Electrical and acoustic noise
isolation
• STP(spatial variation of
potential in a current carrying
film).
• Stability against thermal drift
• BEEM (Interfacial properties,
Schottky barriers).
• STM Mechanical stability
• Reliable tip - sample
positioning
• Good tips
Electronics
• Current to voltage converter: Gain 108-1010
• Bias Circuit
• Feedback Electronics: Error amplifier, PID
controller, few filters.
• Scan Electronics: +X -X +Y -Y ramp signals
(generated by the DA card).
• HV Circuit amplifies the scan voltages and the
feedback signal to ± 100 V from ± 10 V.
• Data acquisition and image display
STM Images
HOPG: ambient
Physics dept, IISc, India
Si(7X7): UHV
Courtesy: RHK Tech.
Nasa nano group
More pictures
• 2.6 nm X 2.6 nm self
assembled organic
film. Molecular
resolution.
NASA nano group
• Quantum corral
Fe on Cu(111)
Courtesy: Eigler, IBM Almaden
Scanning tunneling spectroscopy
• dI/dV  DOS of sample
• J.C. Davis Group, Berkeley.
• Effect of Zn impurity on a
high Tc superconductor
• T: 250mK.
Scanning tunneling potentiometry
Platinum film
Physics dept, IISc, India
ATOMIC FORCE MICROSCOPE
www.fys.kuleuven.ac.be ; www.chem.sci.gu.edu.au
AFM modes of operation
• Contact mode
Force: nano newtons
• Non-contact mode
Force: femto newtons
Freq. of oscillation 100kHz
• Intermittent contact
• Image any type of
sample.
Park Scientific handbook
AFM Images
Mica: digital instruments; Grating: www.eng.yale.edu
Acronyms galore!
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MFM: Magnetic force microscopy
EFM: Electrostatic force microscopy
TSM: Thermal scanning microscopy
NSOM: Near field scanning optical
microscope
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Top-down techniques take a bulk material, machine it, modify it into the
desired shape and product
- classic example is manufacturing of integrated circuits
using a sequence of steps sush as crystal growth, lithography, deposition,
etching, CMP, ion implantation…
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(Fundamentals of Microfabrication: The Science of
Miniaturization, Marc J. Madou, CRC Press, 2002)
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Bottom-up techniques build something from basic materials
- assembling from the atoms/molecules up
- not completely proven in manufacturing yet
Examples:
Self-assembly
Sol-gel technology
Deposition (old but is used to obtain nanotubes, nanowires, nanoscale films…)
Manipulators (AFM, STM,….)
3-D printers (http://web.mit.edu/tdp/www)
• Physical
Thermal evaporation
Sputtering
• Chemical (CVD)
• Plasma deposition
• Molecular beam epitaxy
(can be physical or chemical)
• Laser ablation
• Sol-gel processing
• Spin coating
• Dip coating
• Self-assembling
monolayers
• Thermal evaporation
- Old technique for thin film dep.
- Sublimation of a heated material onto a substrate in a vacuum
chamber
 # 
- Molecular flux cm2 .s  = N0 exp  e / kT
 e = activation energy
- heat sources for evaporation (resistance, e-beam, rf, laser)
• Sputtering
- The material to be deposited is in the form of a disk (target)
- The target, biased negatively, is bombarded by positive ions
(inert gas ions such as Ar+) in a high vacuum chamber
- The ejected target atoms are directed toward the substrate
where they are deposited.
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Versatile process for making ceramic and glass materials (powders, coatings,
fibers… variety of forms).
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Involves converting from a liquid ‘solution’ to a solid ‘gel’
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Start with inorganic metal salts or metal alkoxides (called precursors); series of
hydrolysis and polymerization reactions to prepare a colloidal suspension (sol).
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Next step involves an effort to get the desirable form
thin film by spin or dip coating
casting into a mold
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Further drying/heat treatment, wet gel is converted into desirable final product
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Aerogel: highly porous, low density material obtained by removing the liquid in a
wet gel under supercritical conditions
• Ceramic fibers can be drawn from the gel by adjusting the
viscosity
• Powders can be made by precipitation, or spray pyrolysis
• Examples
- Piezoelectric materials such as lead-zircomium-titanate (PZT)
- Thick films consisting of nano TiO2 particles for solar cells
- Optical fibers
- Anti-reflection coatings (automotive)
- Aerogels as filler layer to replace air in double-pane structures
• Check http://www.mit.edu/tdp/www
• Solid freeform fabrication, currently working only at sub-mm
level, is amenable for nanoscale prototyping
• Works by building parts in layers. Starts with a CAD model for
the structure
• Each layer begins with a thin distribution of powder spread over
the surface of a powder bed
• Technology similar to ink-jet printing
• A binder material selectively joins particles where the object
formation is desired
• A piston is lowered that leads to spreading the next layer
• Layer-by-layer process is repeated
• Final heat treatment removes unbound powder
• Allows control of composition, microstructure, surface structure