PowerPointOverview - Universal Microsystems

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Universal Microsystems

Gas Flow Restrictors for the Semiconductor Industry

Company founded in 1999 Partnership with TEM Filter 3350 Scott Blvd. Santa Clara, CA Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Uses for Gas Flow Restrictors

• Replace MFC in fixed process applications – steady pressure, single flow set point • Safety — limit flow in case of line failure • Tamperproof needle valve replacement • Flow splitting • eliminates multiple MFCs • Back fill a chamber in a fixed time Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

UMS Gas Flow Restrictors

• Orifice inside 316L SS container • High accuracy calibration (± 1.0%) • Three orifice materials available – SS, & Single crystal sapphire or silicon • Quick turn production Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Orifice Flow vs Pressure

500 400 300 Atmosphere Outlet Vacuum Outlet Sonic 200 100 Sub-sonic 0 15 17 19 21 23 25 27

Pressure, Psia

29 31 33 35 Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Orifice Characteristics

• Completely stable • No Particle Generation • Minimal dry down time • Precision of flow at specified pressure – +/- 5% standard, +/- 2% available • Orifice will not clog like a filter Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Restrictor body types available

• 1/4 “ Male/Male VCR • 1/8” Male/Male VCR • 1/4” Female/Male VCR • 1/4” BulkHead VCR • Ni media Filter/Restrictor Combination • 1 1/8” surface mount sandwich Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

B-Series

M/M VCR

Flow Restrictor

.625” 1.55” .75” • VCR Male Union • Flow Direction Arrow • External Part No. Label Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

F/M or M/F Versions

•Gland to gland 1.80” •Diameter 0.75” •Wrench Flats 5/8” Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Filter/Restrictor Combination

Precise flow at a specified pressure

Specifications  3    at rated flow  -9 atm sccm/sec Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Surface Mount Sandwich Restrictor

Top ¼” Flow 2-port IGS configuration 1 1/8 ” body size • Restrictor can be inserted into either port • 3 Port version available Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

UMS Flow Restrictor Specifications

• Surface finish, 7-8 Ra electropolish • Base Material, 316L SS, • Orifice material, Si, Sapphire, or SS • Seal for Si (Viton or Kalrez) • He leak check 10 -9 atm-cc/sec • Maximum pressure, 200 psia • Temperature range, 50 to 250 o F Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Sapphire Orifices

Orifice diameters from 0.003” to 0.040” Variation in diameter is +/- 2.5µm Nozzle side Cross Section Different manufacturing runs likely to see different means but tight distribution -2.5 µm +2.5 µm Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Silicon Orifices

• Used for diameters < 0.003” – or non-integer .001” units Cross-section nozzle side • Flow from nozzle side 10-15% greater • Avoid placing downstream from F plasma 50 µm • Option: sputter deposit Al 2 0 3 (both sides) • Opportunity to enlarge undersized orifices – Oxidation and strip - 50 - 1000 nm Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Stainless Steel Orifices

Cross-section 250 µm • Mechanical drill OK down to 0.030” Use EDM down to 0.004” • EDM precision is +/- 1.5% at .008” • EDM most expensive of three types Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

Standard Orifices

& N 2 flow @ 20 psig • Flow range -15 sccm to 40 slm • Flow steps in ~ 10% • Sapphire orifices designated with N or R, SS orifices with F and Si orifices with S • N orifices nozzle side inlet R orifices nozzle side outlet Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054

How to find required orifice

• This procedure converts the application gas flow at the application pressure into the equivalent N 2 flow at 20 psig • Match the converted flow to the flow table Universal Microsystems, 3350 Scott Blvd. Bldg 47, Santa, Clara, CA 95054