Transcript 2016 Nima Kalhor and Paul F. A. Alkemade Resist Assisted

2016
Nima Kalhor and Paul F. A. Alkemade
Resist Assisted Patterning
In: Gregor Hlawacek and Armin Gölzhäuser, editors: "Helium Ion Microscopy", Springer
(2016) 395-414
M. A. J. Bouwens, D. J. Maas I. C. J. van der Donck, P. F. A. Alkemade, and P. van der
Walle
Enhancing re-detection efficacy of defects on blank wafers using stealth fiducial markers
Microelectronic Engineering 153 (2016) 48-54
2015
Gaurav Nanda, Emile van Veldhoven, Diederik Maas, Hamed Sadeghian, and Paul F. A.
Alkemade
Helium ion beam induced growth of hammerhead AFM probes
Journal of Vacuum Science and Technology B 33 (2015) 06F503
H. C. Overweg, A. M. J. den Haan, H. J. Eerkens, P. F. A. Alkemade, A. L. La Rooij, R. J. C.
Spreeuw, L. Bossoni, and T. H. Oosterkamp
Probing the magnetic moment of FePt micromagnets prepared by focused ion beam milling
Applied Physics Letters 107 (2015) 072402
Gaurav Nanda, Srijit Goswami, Kenji Watanabe, Takashi Taniguchi, and Paul F. A.
Alkemade
Defect Control and n-Doping of Encapsulated Graphene by Helium-Ion-Beam Irradiation
Nano Letters 15 (2015) 4006-4012
Nima Kalhor, Wouter Mulckhuyse, Paul Alkemade, and Diederik Maas
Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV
resist
Proceedings of SPIE 9425 (2015) 942513
2014
J. O. Island, A. Holovchenko, M. Koole, P. F. A. Alkemade, M. Menelaou, N. Aliaga-Alcalde,
E. Burzuri, and H. S. J. van der Zant
Fabrication of hybrid molecular devices using multi-layer graphene break junctions
Journal of Physics Condensed Matter 26 (2014) 474205
P.F.A. Alkemade and H. Miro
Focused helium-ion-beam-induced deposition
Applied Physics A 117 (2014) 1727-1747
2012
Philip F. Chimento, Paul F. A. Alkemade, Gert W. ’t Hooft, and Eric R. Eliel
Optical angular momentum conversion in a nanoslit
Optics Letters 37 (2012) 4946-4948
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P.F.A. Alkemade and E. van Veldhoven
Deposition, milling, and etching with a focused helium ion beam
In: M. Stepanova and S. Dew, editors: "Nanofabrication: Techniques and Principles",
Springer (2012) 275-300
Paul F. A. Alkemade, Emma M. Koster, Emile van Veldhoven, and Diederik J. Maas
Imaging and Nanofabrication With the Helium Ion Microscope of the Van Leeuwenhoek
Laboratory in Delft
Scanning 34 (2012) 90–100
2011
Diederik J. Maas, Emile W. van der Drift, Emile van Veldhoven, Jeroen Meessen, Maria
Rudneva, and Paul F. A. Alkemade
Nano-engineering with a focused helium ion beam
Mater. Res. Soc. Symp. Proc. 1354 (2011) 33–47
Paul F.A. Alkemade, H. Miro, Emile van Veldhoven, Diederik J. Maas, Daryl A. Smith, and
Philip D. Rack
Pulsed Helium Ion Beam Induced Deposition: A Means to High Growth Rates
Journal of Vacuum Science and Technology B 29 (2011) 06FG05-1
Philip F. Chimento,_Nikolay V. Kuzmin, Johan Bosman, Paul F. A. Alkemade, Gert W. ’t
Hooft, and Eric R. Eliel
A subwavelength slit as a quarter-wave retarder
Optics Express 19 (2011) 24219-24226
Lucio Robledo, Lilian Childress, Hannes Bernien, Bas Hensen, Paul Alkemade, and Ronald
Hanson
High-fidelity projective read-out of a sloid-state spin quantum register
Nature 477 (2011) 574-578
Rene Kregting, Sander Gielen, Willem van Driel, Paul Alkemade, Hozan Miro, and Jan-Dirk
Kamminga
Local stress analysis on semiconductor devices by combined experimental-numerical
procedure
Microelectronics Reliability 51 (2011) 1092-1096