Lecture 4 CMOS Inverter References • Section 4.2,4.3,4.6 (Hodges) 5 Regions of Operations I: N(off), P(lin) As you increase Vin from 0 V to 1.8
Download ReportTranscript Lecture 4 CMOS Inverter References • Section 4.2,4.3,4.6 (Hodges) 5 Regions of Operations I: N(off), P(lin) As you increase Vin from 0 V to 1.8
Lecture 4 CMOS Inverter References • Section 4.2,4.3,4.6 (Hodges) 5 Regions of Operations I: N(off), P(lin) As you increase Vin from 0 V to 1.8 V, you progress from region I to region V. Current Draw of a CMOS Inverter Ideal Voltage Transfer Characteristics of an Inverter Large Input Range/Small Output Range →Noise Immunity. Range: the voltage interval over which the signal is either a 1 or a 0. Practical VTC of an Inverter Gain=ΔVout/ΔVin VS is defined by Vout=Vin Not GND Effect of Input Noise on the Output Noise Margin Output of the Driving Stage Input of the Receiving Stage Unity Gain Noise Margin Definitions NML=VIL-VOL NMH=VOH-VIH If Vin>VIL, the gain exceeds unity and the output begins to drop significantly. General Analysis Methodology Region I: N-OFF, P-Triode Region II: IDN(Sat)=IDP(Triode)→VIL(Cumbersome to calculate analytically) Region III: IDN(Sat)=IDP(Sat)→VS(Switching voltage) Region IV: IDN(Triode)=IDP(Sat) →VIH(Cumbersome to calculate analytically) Region V: N-Triode, P-OFF Current Consumed by a CMOS Inverter TSMC 0.18 um Example WN/LN=200nm/200nm WP/LP=200nm/200nm Computation of VS • See Derivation in the Handout • Assume: – 0.18 um TSMC CMOS – WN/LN=200nm/200nm; WP/LP=200nm/200nm – ECNLN=4.8V; ECPLP=1.2V • Hand Analysis using (EQ 4.15 /EQ 4.14): 0.76V • Spice: 0.748 V VS of TSMC 0.18 um Assume: 0.18 um TSMC CMOS WN/LN=200nm/200nm WP/LP=200nm/200nm Adjust VS • Knob: – χ as defined in EQ. 4.15 – Increase WNLP/LNWP→ Decreased VS. – Decrease WNLP/LNWP → Increased VS. Increase WP to adjust VS WN/LN=200nm/200nm WP/LP=200nm/200nm WN/LN=200nm/200nm WP/LP=460nm/200nm Noise Margin • VOH=VDD • VOL=0 V • Determine VIL and VIH from the -1 slope. VIL WN/LN=200nm/200nm WP/LP=460nm/200nm VIH WN/LN=200nm/200nm WP/LP=460nm/200nm NM Calculation • Process: TSMC 0.18 um – WN/LN=200nm/200nm; WP/LP=460nm/200nm • • • • • • • VS=0.809 V VOH=1.8 V VOL=0 V VIL=0.66 V VIH=0.905V NML=VIL-VOL=0.66 V-0V=0.66V NMH=VOH-VIH=1.8 V-0.905V=0.895 V 50% Propagation Delay Propagation Delay of CMOS Inverter 50% Propgation Dealay: 0.69 ReffCL CMOS Inverter Calculation tPHL • Δt=CL ΔV/(IDS) – ΔV=VDD/2 (from VDD to VDD/2) – IDS • NMOS is in Saturation (Hand Out) • tpHL=0.69ReffnCL • tpHL=CL ΔV/(IDSAT) • Reffn=(VDD/2)/(0.69IDSAT) tPLH • Δt=CL ΔV/(IDS) – ΔV=VDD/2 (from 0 to VDD/2) – IDS • PMOS is in Saturation (Hand Out) • tpLH=0.69ReffpCL • tpLH=CL ΔV/(IDSAT) • Reffp=(VDD/2)/(0.69IDSAT) Reff Comparison for 0.18 um Process 0.18 um NMOS Reff,calc (kOhm/SQ) 11.911 0.18 um PMOS 28.026 Reff,list (kOhm/SQ) 30 12.5 Reff: unit is Kohm/SQ RN=ReffN(LN/WN) RP=ReffP(LP/WP) Design Example • Design Constraints: – tPHL<50 pS, tPLH<50 pS – Load Capacitor: 50 fF – Use minimum W and L to attain the specs. • Determine W/L for PMOS and NMOS • Method: – – – – – – tPHL=tPLH=50 pS=0.7ReffCL Use Reffn=12.5 KOhm/SQ and Reffp=30 KOhm/SQ Reff=1.4 Kohm Reff=Reffn(Ln/Wn); Reff=Reffp(Lp/Wp) Use minimum Ln. Wn=1.784 um; Wp=4.284 um tPLH tPHL