Lecture 4 CMOS Inverter References • Section 4.2,4.3,4.6 (Hodges) 5 Regions of Operations I: N(off), P(lin) As you increase Vin from 0 V to 1.8

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Transcript Lecture 4 CMOS Inverter References • Section 4.2,4.3,4.6 (Hodges) 5 Regions of Operations I: N(off), P(lin) As you increase Vin from 0 V to 1.8

Lecture 4
CMOS Inverter
References
• Section 4.2,4.3,4.6 (Hodges)
5 Regions of Operations
I: N(off), P(lin)
As you increase Vin from 0 V to
1.8 V, you progress from region I
to region V.
Current Draw of a CMOS Inverter
Ideal Voltage Transfer Characteristics
of an Inverter
Large Input Range/Small Output Range →Noise Immunity.
Range: the voltage interval over which the signal is either a 1 or a 0.
Practical VTC of an Inverter
Gain=ΔVout/ΔVin
VS is defined by Vout=Vin
Not GND
Effect of Input Noise on the Output
Noise Margin
Output of the
Driving Stage
Input of the
Receiving Stage
Unity Gain Noise Margin Definitions
NML=VIL-VOL
NMH=VOH-VIH
If Vin>VIL, the gain exceeds unity and the output begins
to drop significantly.
General Analysis Methodology
Region I: N-OFF, P-Triode
Region II: IDN(Sat)=IDP(Triode)→VIL(Cumbersome to calculate analytically)
Region III: IDN(Sat)=IDP(Sat)→VS(Switching voltage)
Region IV: IDN(Triode)=IDP(Sat) →VIH(Cumbersome to calculate analytically)
Region V: N-Triode, P-OFF
Current Consumed by a CMOS Inverter
TSMC 0.18 um Example
WN/LN=200nm/200nm
WP/LP=200nm/200nm
Computation of VS
• See Derivation in the Handout
• Assume:
– 0.18 um TSMC CMOS
– WN/LN=200nm/200nm; WP/LP=200nm/200nm
– ECNLN=4.8V; ECPLP=1.2V
• Hand Analysis using (EQ 4.15 /EQ 4.14): 0.76V
• Spice: 0.748 V
VS of TSMC 0.18 um
Assume:
0.18 um TSMC CMOS
WN/LN=200nm/200nm
WP/LP=200nm/200nm
Adjust VS
• Knob:
– χ as defined in EQ. 4.15
– Increase WNLP/LNWP→ Decreased VS.
– Decrease WNLP/LNWP → Increased VS.
Increase WP to adjust VS
WN/LN=200nm/200nm
WP/LP=200nm/200nm
WN/LN=200nm/200nm
WP/LP=460nm/200nm
Noise Margin
• VOH=VDD
• VOL=0 V
• Determine VIL and VIH
from the -1 slope.
VIL
WN/LN=200nm/200nm
WP/LP=460nm/200nm
VIH
WN/LN=200nm/200nm
WP/LP=460nm/200nm
NM Calculation
• Process: TSMC 0.18 um
– WN/LN=200nm/200nm; WP/LP=460nm/200nm
•
•
•
•
•
•
•
VS=0.809 V
VOH=1.8 V
VOL=0 V
VIL=0.66 V
VIH=0.905V
NML=VIL-VOL=0.66 V-0V=0.66V
NMH=VOH-VIH=1.8 V-0.905V=0.895 V
50% Propagation Delay
Propagation Delay of CMOS Inverter
50% Propgation Dealay: 0.69 ReffCL
CMOS Inverter Calculation
tPHL
• Δt=CL ΔV/(IDS)
– ΔV=VDD/2 (from VDD to VDD/2)
– IDS
• NMOS is in Saturation (Hand Out)
• tpHL=0.69ReffnCL
• tpHL=CL ΔV/(IDSAT)
• Reffn=(VDD/2)/(0.69IDSAT)
tPLH
• Δt=CL ΔV/(IDS)
– ΔV=VDD/2 (from 0 to VDD/2)
– IDS
• PMOS is in Saturation (Hand Out)
• tpLH=0.69ReffpCL
• tpLH=CL ΔV/(IDSAT)
• Reffp=(VDD/2)/(0.69IDSAT)
Reff Comparison for 0.18 um Process
0.18 um NMOS
Reff,calc (kOhm/SQ) 11.911
0.18 um PMOS
28.026
Reff,list (kOhm/SQ)
30
12.5
Reff: unit is Kohm/SQ
RN=ReffN(LN/WN)
RP=ReffP(LP/WP)
Design Example
• Design Constraints:
– tPHL<50 pS, tPLH<50 pS
– Load Capacitor: 50 fF
– Use minimum W and L to attain the specs.
• Determine W/L for PMOS and NMOS
• Method:
–
–
–
–
–
–
tPHL=tPLH=50 pS=0.7ReffCL
Use Reffn=12.5 KOhm/SQ and Reffp=30 KOhm/SQ
Reff=1.4 Kohm
Reff=Reffn(Ln/Wn); Reff=Reffp(Lp/Wp)
Use minimum Ln.
Wn=1.784 um; Wp=4.284 um
tPLH
tPHL