Effects of target current on the mechanical properties of Cr-C coatings by using the Unbalanced Magnetron Sputtering Professor: Dr.

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Transcript Effects of target current on the mechanical properties of Cr-C coatings by using the Unbalanced Magnetron Sputtering Professor: Dr.

Slide 1

Effects of target current on the mechanical
properties of Cr-C coatings by using the
Unbalanced Magnetron Sputtering
Professor: Dr. Yu-Sen Yang
Speaker:Jia-Hau Lin

Date : 2011.05.20
Metallography Lab.

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Slide 2

Outline
Introduction
Experiment
Results and discuss
Conclusion

Metallography Lab.

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Slide 3

Introduction
1.The chromium carbide (Cr-C) films have excellent
properties including chemical stability, oxidation
resistance, low coefficient of friction and wear
resistance.
2. The excellent anti-wear performance of Cr-C films
can be attributed to the large content of carbide.
3. Cr-C coatings have been known to protected tools
which may be damaged by high thermal load (high
cutting speed).
Metallography Lab.

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Slide 4

Experiment (equipment)
Equipment: Unbalance magnetron sputtering
Substrate: high speed steel(SKH51)
Closed unbalanced magnetron sputtering system
Cathode

Top-view
N

S

Magnets
N

Reactive gas
(nitrogen,argon,
Acetylene)
Front-view

550 mm

Closed
magnetron field

S

Cr

N

Cr

N

330 mm

S

Cr

S

S

z
y

o

Cr

Specimen
Work
distance

Rotor

Target
Specimen
holder
Shield

x
N

S

o

x

N

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Slide 5

Experiment (parameter)
1.Ar cooling time after deposition

20 Min

2.Substrate bias

-100 V

3.Chromium target current

1A,2A,3A,4A,5A,6A

4.C2H2 flow rate ratio

30 %

5.Ion bombardment voltage

-300 V

6.Work distance

13 cm

7.Frequency of substrate

100 KHz

8.Rotation speed of substrate holder

5rpm

資料來源:黃文毅,2010,利用非平衡磁控濺鍍Cr-C薄膜機械性
質之研究,國立高雄第一科技大學,碩士論文

Metallography Lab.

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Slide 6

Experiment (Properties test )
1.Component Analysis: EDS
2.Morphology: FE-SEM
3.Microstructure: Raman Analysis
4.Friction coefficient: Ball-on-disc

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Slide 7

Experiment (Properties test )
5.Wear rate estimation: Calculated after measuring wear
track by Alpha-step
(1)Alpha-Step量測磨痕斷面面積
(2)計算磨耗體積及磨耗率
V  2  RA


1
  r  ( x 
n


n 1

3 y i 1  y i  y i 1

 6y
i 1

i 1

 3 y i  y i 1


x)


n 1

  ( y i  y i 1 )  x
i 1

V:體積,R:質心半徑,A:不規則形狀面積

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Slide 8

Results and discuss (Component Analysis)
Cr靶電流

Cr( at.%)

C ( at.%)

1A

5.8

94.2

2A

22.2

77.8

3A

47.3

52.7

4A

59.3

40.7

5A

63.8

36.2

6A

68.9

31.1

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Slide 9

Results and discuss( Friction coefficient test)

1A

2A

3A

4A

5A

6A

0.29

0.22

0.39

0.61

0.78

0.66

Against ball

Loading

Rotation diameter

Rotation rate

Length

Cr ball

0.5kg

20mm

286rpm

1000m

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Slide 10

Results and discuss (Wear rate)

單位:mm3‧N-1‧m-1

1A

2A

3A

6*10-6

24*10-6

142*10-6

4A

5A

270*10-6 303*10-6

6A
423*10-6

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Slide 11

Results and discuss (friction coefficient)

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Slide 12

Results and discuss (Wear rate)

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Slide 13

Results and discuss
1A

6A

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Slide 14

Results and discuss(Raman)
D band :1350 cm-1
G band:1580 cm-1
材料及其結構

拉曼波峰位置
(cm-1)

天然鑽石

1332~1334

天然鑽石(C12)

1323

石墨

1350
1580~1600

合成鑽石(C13)

1290

合成鑽石膜

1332

非晶質碳(a-C)
及類鑽碳膜

1350附近
1580附近

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Slide 15

Conclusions
 The experimental results show the carbon content in Cr-C
films increase with decreasing target current when target
current decrease from 6A to 1A,the carbon content increase
from31.1 at.% to at 94.2 at.% .
 The friction coefficient of films decrease from 0.66 to 0.22 and
the wear rate is reduced from 423‧10-6 (mm3‧N-1‧m-1) to
6‧10-6 (mm3‧N-1‧m-1) when the current reduced from 6A to
1A.
 The lowest wear rate is 6‧10-6 (mm3‧N-1‧m-1) at traget current
1A
 The lowest friction coefficient is 0.22 at traget current 2A
 The excellent anti-wear performance of Cr-C films can be
attributed to the large content of carbide.

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Slide 16

 The reasons for a low coefficient of friction is the
formation of solid solution carbon in the diamondlike carbon film in the crystal structure, which could
effectively reduce wear and promote the wear
resistance characteristics.

Metallography Lab.

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Slide 17

The End
Metallography Lab.

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