Transcript Small Feature Reproducibility Measuring, Understanding and

Small Feature Reproducibility
3rd Annual SFR Workshop & Review, May 24, 2001
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Research and Educational Objectives / Spanos
CMP / Doyle, Dornfeld, Talbot, Spanos
Plasma & Diffusion / Graves, Lieberman, Cheung, Haller
break
Poster Session / Education, CMP, Plasma, Diffusion
lunch
Lithography / Spanos, Neureuther, Bokor
Sensors & Controls /Aydil, Poolla, Smith, Dunn, Cheung, Spanos
Break
Poster Session / all subjects
Steering Committee Meeting in room 373 Soda
Feedback Session
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Small Feature Reproducibility
Measuring, Understanding and Controlling
Variability in Deep Sub-micron Patterning
UC-SMART Major Program Award
E. Aydil, J. Bokor, N. Cheung, D. Dornfeld, F. Doyle, B. Dunn, D. Graves, E.
Haller, M. Lieberman, A. Neureuther, K. Poolla, R. Smith, C. Spanos, J. Talbot
University of California
Berkeley, Davis, Los Angeles, Santa Barbara, San Diego
Third Annual Workshop & Review
5/24/2001
5/24/2001
SFR Workshop - Overview
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Program Goals
• We have pursued solutions by focusing on:
– fundamental understanding
– modeling variability mechanisms
– sensing variability causes during production
• We will are now focusing on controlling and
improving variability.
• Our context is lithography, plasma, CMP, diffusion,
and the way these steps interact with each other.
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SFR Workshop - Overview
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Small Feature Reproducibility
• Capture
– In-situ and off-line metrology
– Hierarchical Analysis of Variance
• Understand
– Resist, Plasma, Diffusion Modeling
– Variability Impact on Device / Interconnect Performance
• Enable
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Fundamental modeling of variability
Optimal recipe generation
On-wafer / real-time / in-situ sensors
Run-to-run and real-time control
Process diagnosis
Chamber, process and product design
5/24/2001
SFR Workshop - Overview
2000-2003
themes
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Industrial / Academic Team
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Advanced Energy
ASML
Atmel Corp.
Advanced Micro Devices
Applied Materials
Asyst Technologies Inc.
Cymer
Etec Systems Inc.
Intel Corporation
• KLA-TENCOR
• Lam Research Corp.
• Mykrolis Corp.
• Nikon Research Corp.
• Novellus Systems Inc.
• Silicon Valley Group
• Schlumberger
• Tokyo Electron
University of CA, Berkeley, Davis, Los Angeles,
Santa Barbara, San Diego
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SFR Workshop - Overview
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Our Research Structure
• Education
– Spread the word through workshops, GSRs, USRs, long / short courses,
and freshman seminars.
• Novel Technologies
– Study bold new process steps and methods in order to leapfrog current
technology limitations.
• Modeling and Simulation
– Develop goal-oriented numerical and statistical abstractions for processes
and their respective hardware.
• Sensors and Metrology
– Justify and spearhead smart sensors that transcend process steps and
technology generations.
• Recipe Generation, Process Optimization and Control
– Enable better process agility, reliability and reproducibility.
5/24/2001
SFR Workshop - Overview
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SFR First year Milestones, due September 30, 2001
Novel Technologies
• Initial experiments and simulations for resist processes, polarization masks,
and multi-parameter test structures. (Neureuther) done
• Metalorganic precursor doser. Preliminary deposition studies. Self-limiting
film formation for low toxicity precursors. (Graves) changed to:
Focus on TiN barrier layers deposited by novel ALD technology: REALCVD.
Conduct preliminary film deposition studies. Test self-limiting film formation
for various precursors. on target
• Etch resist in LAPS to examine uniformity. Characterize instability using
OES/actinometry and planar probe. (Lieberman) done
• Establish plasma recipes and adhesion data for plasma-treated Si, oxide, and
metal surfaces. (Cheung) on target
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SFR Workshop - Overview
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SFR First year Milestones, due September 30, 2001
Modeling and Simulation
• Determine importance of physical effects on resist chemistry/optics
interaction using simulation and experiment. (Neureuther) on target
• Molecular dynamics code for deposition energy. Preliminary sputtering
studies, compare to phenomenological theory. (Graves) changed to:
Focus on plasma reactor modeling of etch products transport (SiClx). Role
of gas inlet and outlet, flow rates on redeposition. Develop experimental
testbed to examine plasma-wall interactions. on target
• Simulations for AMD device designs at 100nm, 70 nm, and 50 nm gate
length, including effect of isolation roughness. (Bokor) on target
• Analyze boron diffusion in silicon isotope hetero-structures. Predictive
model for various experimental conditions. (Haller) on target
• Integrated CMP model for basic mechanical and chemical elements.
Periodic grating metrology (Dornfeld, Talbot, Spanos) on target
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SFR Workshop - Overview
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SFR First year Milestones, due September 30, 2001
Sensors and Metrology
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Build and demonstrate Langmuir probe based on-wafer ion flux probe array using external
electronics. (Aydil) on target
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Design and build a single MEMS based retarding field ion energy analyzer with external
electronics. (Poolla) (similar project at Sandia) changed to:
Thermal Flux Sensor for Etch Processes. Design and fabricate sensor. Test sensor in Xenon
DiFloride ecth. Evaluate sensitivities. on target
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Design and fabricate first generation prototype MEMS sensor array. Bench test using Joule
heating. (Smith) on target
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Demonstrate cut-and-paste approach for membrane arrays, LED arrays, and battery
encapsulation. (Cheung) done
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Develop thermally robust inorganic electrolyte. Lid added to battery encapsulation scheme.
(Dunn) on target
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Build Microplasma generating system. Test with bulk optical components. (Poolla, Graves)
(Prof. Solgaard left) changed to:
Electrical Impedance Tomography based Sensor to measure Spatially-resolved Natural Plasma
Potential. Design sensor. Evaluate sensitivities. Study and devise efficient algorithms for
inversion. Test numerical effectiveness in simulation studies. on target
5/24/2001
SFR Workshop - Overview
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SFR First year Milestones, due September 30, 2001
Recipe Generation, Process Optimization and Control
• Install automated OES on LAM 9400 reactor and build large statistical
database of process fingerprinting data. (Spanos) on target
• Install the Z-scan sensor and explore the spectral RF signature of plasma
instabilities. (Spanos, Lieberman) on target
• Publish ellipsometric detection specifications for full-profile, 100nm
metrology. (Spanos) done
• Demonstrate simulator tuning for full profile matching over a range of focus
and exposure conditions. (Spanos) on target
• Develop performance metrics for CMP and lithography. Assess input
sensitivity and controllability. (Poolla) on target
5/24/2001
SFR Workshop - Overview
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SFR First year Milestones, due September 30, 2001
Education
• Second offering of the cross listed 133 course: increase student numbers
from 16 to 24. Additional experiment: spin coating low k dielectric. Add
plasma diagnostics to etch experiment. (Graves) refined/modified to:
Additional experiment: spin coating low k dielectric. (Switched with year 2
milestone). Add plasma diagnostics to etch experiment. done
Offer 133 as summer UC Extension course. planned
Develop web-based equipment simulation. begun
• Organize two workshops (Fall and Spring) for all the project participants.
(Spanos) done
5/24/2001
SFR Workshop - Overview
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SFR Second year Milestones, due September 30, 2002
Novel Technologies
Conduct and quantitatively interpret resist processes, polarization masks, and multi-parameter test structures. (Neureuther)
Study effects of surface preparation, type and temperature on film properties. Measure key radical-surface kinetics. (Graves)
Characterize plasma instability using V-I-phase probe. Model for reduced electron temperature and density. (Lieberman)
Demonstrate polymer surface modification with plasma implantation (Cheung)
Modeling and Simulation
Guidelines for 3D defect sizing and feature interactions. Extend line-end shortening to underlying topography. (Neureuther)
Code to study ion-induced surface diffusion. Compare results to phenomenological theory and experiment. (Graves)
Wafers processed at AMD finished with varying, and well-characterized LER. (Bokor)
Model diffusion of dopants in isotopic multilayer structures. Study interference between diffusion and native defects. (Haller)
Integrate initial chemical models into basic CMP model. Validate predicted pattern development. (Dornfeld, Talbot)
Sensors and Metrology
Build and demonstrate 8” on-wafer ion flux probe array in industrial plasma etcher with external electronics. (Aydil)
Demonstrate MEMS based thermal flux probe in plasma with external electronics. (Poolla) changed
Integrate the inorganic electrolyte into the battery structure. Develop an in-situ lithium formation process. (Dunn)
Implement Prototype Plasma Tomography Sensor, test for etch rate metrology. (Poolla) changed
Recipe Generation, Process Optimization and Control
Automated fault detection using RF fingerprinting. Automated generation of syntactic rules for RF fingerprinting. (Spanos)
Feasibility of building 100nm capable profile extraction using small footprint, in-line spectroscopic ellipsometry. (Spanos)
Demonstrate simulator tuning (using Prolith) for full statistical profile matching over a range of conditions. (Spanos)
Design optimal recipes for unit processes, evaluate robustness using simulators and experiments. (Poolla)
Education
Offer 133 as summer UC Extension course. Develop of web-based equipment simulation. (Graves)
Development and first offering of 1- and 2-hour freshman seminar modules on semiconductor manufacturing. (Lieberman, all)
Organize two workshops (Fall and Spring) for all the project participants. (Spanos, all)
5/24/2001
SFR Workshop - Overview
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SFR Third year Milestones, due September 30, 2003
Novel Technologies
Design and test apparatus, interpret data for resist, polarization masks, and multi-parameter test structures. (Neureuther)
Study effects of surface preparation, surface type and surface temperature on REALCVD film properties. Measure key
radical-surface kinetics (Graves) changed
Develop and test instabilities control. Reduce electron temperature and density in discharges. (Lieberman, Spanos)
Demonstrate concomitant plasma treated/deposition surfaces as effective diffusion barrier. (Cheung)
Modeling and Simulation
Defect modeling to relate inspection to printing. Link resist, tool and substrate effects to line-end shortening. (Neureuther)
Model etch product creation, transport and redeposition for various Si etch chemistries. Compare experimental results to
simulations (Graves) changed
Device characterization on AMD wafers completed and data analyzed. (Bokor)
Comprehensive model on dopant- and self-diffusion in Si. Properties of dopants and native point defects in silicon. (Haller)
Comprehensive chemical and mechanical model. Experimental and metrological validation. (Dornfeld, Talbot, Spanos)
Sensors and Metrology
Integration of Si-based IC with sensor arrays. Characterize and test integrated thermal flux array. (Aydil, Poolla) changed
Battery operation between room temperature and 150°C. Battery survivability to sensor soldering operation. (Dunn)
Implement Prototype Plasma Impedance Tomography Sensor, test for plasma potential. (Poolla) changed
Recipe Generation, Process Optimization and Control
Study systems of real-time instability detection and plasma stabilization control. Spanos)
Perform field studies of automated OES classification for fault diagnosis. (Spanos)
Implement lithography controller that merges full profile in-line information with available metrology. (Spanos, Poolla)
Model-based RTR control schemes, assess theoretical, simulated and experimental performance on SFR variance. (Poolla)
Education
Add new spin-coating low k dielectric experiment. Develop web-based equipment simulation. Second offering UC Extension
summer short course. (Graves) changed
Freshman seminars related to semiconductor manufacturing at all SFR-participating campuses (Lieberman, all)
Organize two workshops (Fall and Spring) for all the project participants. (Spanos)
5/24/2001
SFR Workshop - Overview
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New Tools
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UC Berkeley Microlab 6” process is functional.
ASML DUV stepper + SVG track.
Hitachi CD SEM.
Novellus M2I 5-chamber sputtering tool.
Complete planarization (CMP/back etch).
State of the art electrical CD metrology.
State of the art RF and OES sensing capabilities.
State of the art thin-film and scatterometry tools.
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SFR Workshop - Overview
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A new 200mm, 20,000ft2 facility by 2004: CITRIS
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SFR Workshop - Overview
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Achievements in Education
• New teaching lab operational, course started in Spring 2000
• EE143 lab has been completely refurbished, ~55 students
enrolled (up almost 60% since before SFR).
• Biweekly teleconferencing seminars continue with technical
talks this semester.
• ~30 graduate students, 14 Professors, 5 UC campuses.
>20 graduate(d) students now work for SFR companies.
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SFR Workshop - Overview
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Some of the SFR Graduates…
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Luan Van, MS (Photoresist roughness studies) – Etec
Alex Goretsky, MS (plasma modeling) – Novellus
Harmeet Singh, PhD (plasma diagnostics) - Lam Research
Kurt Salloux - Hughes Aerospace (to be Boeing eventually); Ph.D. Spring, 2000
Xinhui Niu, PhD in EECS, December 1998, co-founder of Timbre Tech, now a TEL company.
Nickhil Jakatdar, PhD in EECS, January 2000, co-founder of Timber Tech, now a TEL company.
Scott Eitepence, BS in EECS May 2000, summer 2000 internship with Etec, now at AMAT.
Yongsik Moon, PhD Mechanical Engineering, September 1999, now at Applied Materials, CMP.
Gary Lam, BS Mechanical Engineering, Spring 1997 Applied Materials.
Yaoxi Wu, PhD in Materials Science and Engineering, May, 2000.
Alexei Marakhtanov, PhD student in EECS, summer 2000 internship at Lam
Junwei Bao, PhD student in EECS, 2000 internship at AMD, continuing with Timbre/TEL.
Michiel Kruger, PhD student in ME, summer 2000 internship at Applied Materials.
Jiangxin Wang, PhD student in EECS, June 2001, Lam Research.
Junwei Bao, PhD student in EECS, June 2001, Timbre Tech, now a TEL company.
5/24/2001
SFR Workshop - Overview
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SFR Technology Reaches the Real World…
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SFR Workshop - Overview
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SMART Microfabrication Equipment Lab Overview
• Joint EECS/ChE/ME/MSME course at Berkeley available to B.S.,
M.S., and Ph.D. students
• Focus on equipment and processes; existing labs focus on device
fabrication (e.g. UCB/EE143)
• Emphasis on chemical and physical processes occurring within
equipment, including transport, plasma and chemical kinetics,
materials science
• Offered for 2nd time spring ‘01 to 24 students, up from 16 in ‘00.
• Plans to offer course as UC Extension short course, summer ‘01
5/24/2001
SFR Workshop - Overview
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SMART Equipment Lab Update
• 3 new PC’s added in laboratory
 Added statistical analysis of experimental data (JMP)
 Simulation of chemical vapor deposition reactor (FLUENT)
 Vacuum system simulation: pumpdown, conductance, pumping speed.
 Plasma simulations
• Plan to upgrade plasma experiment to include optical emission
spectroscopy and Langmuir probe
• Modification to electrochemical deposition experiment to test
effects of organic additives on growth rates
5/24/2001
SFR Workshop - Overview
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EE 143 – IC Processing Enrollment Statistics
35 Fall 98
EE143 S200146Enrollment
(57 total)
in Fall 99
57 in Spring 2001
Chemistry
5%
ME
11%
Double Major
MSE
7%
7%
BioE
11% Physics
2%
EECS
45%
ChemE
12%
We will further enhance the training laboratory.
We will disseminate course modules to other schools.
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SFR Workshop - Overview
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Enrollment inENROLLMENTS
Semiconductor
Manufacturing
CoursesCOURSES
at Berkeley
MANUFACTURING
IN SEMICONDUCTOR
~ 100 more students a year get exposed to IC Technologies!
400
Course 133
SMART Lab
MSE 125
MSE 123
350
MSE 111
ME 122
ME 101
300
EECS 143
EE 143
ChemE 179
Students Enrolled
250
200
150
100
50
0
93-94
94-95
95-96
96-97
97-98
Academic Year
5/24/2001
SFR Workshop - Overview
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99-00
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2000-2003 Education Goals
• Freshman seminar program at all campuses
– One seminar per faculty member per year - 13 seminars/yr
– 15 freshmen per seminar
– Related to semiconductor manufacturing and the Department discipline
• UC Extension summer offering of Equipment Lab
– First offering in Summer 2001
• Undergraduate internships at participating companies
– At least five positions
• Seminar series with industrial speakers?
– Biweekly, with emphasis on business and technology
5/24/2001
SFR Workshop - Overview
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Freshman Seminars
• Freshman seminar offered fall 2000 in chemical
engineering (24 students)
• Seminar emphasizes semiconductor industry and
semiconductor processes.
~10 such seminars will be deployed in fall 2001 and
spring 2002, reaching ~200 students across 4
campuses.
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SFR Workshop - Overview
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Example of Freshman Seminar
TV with cover off - PC/disk drive - Laser printer - Silicon run Moore’s law - Liquid crystal - Cell phones - MEMS - IC design /
fabrication sequence - super clean manufacturing… etc.
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SFR Workshop - Overview
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Internships at Participating Companies
• At least five summer undergraduate positions each year
• Student applications late in Fall Semester
– Advertise among 300+ students taking semiconductor manufacturing courses
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Identify positions by end of January
Select and fill positions by end of March
Company Mentors and UC PIs coordinate exchange
Coordinate with EECS BS/MS Internship Program
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Seminar Series With Industrial Speakers
• Create bi-weekly seminar series with invited speakers from the
participating companies
• Emphasis on business and technology highlights
We are now asking/selecting presentation proposals!
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SFR Workshop - Overview
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Today’s Objectives
1. Present and discuss 2000-2001 progress.
2. Bring PIs, students, industrial participants together.
Emphasis of presentations shifted to poster session.
3. Collect Feedback from Steering Committee
Closed meeting and feedback session this afternoon.
5/24/2001
SFR Workshop - Overview
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People to Meet and Places to Go
Web site, etc.
Account Management
Xuan Nguyen
Diane Chang & Dianne Ollila Charlotte Jones
550 Cory Hall,
phone: (510) 643-7542
fax: (510) 642-2739
[email protected]
558 Cory Hall, ERL
phone: (510) 642-4043
fax: (510) 642-2739
[email protected]
Administrative Support
558 Cory Hall, ERL
phone: (510) 642-1818
fax: (510) 642-2739
[email protected]
University of California, Berkeley CA, 94720-1770
http://sfr.berkeley.edu
Access restricted by password
5/24/2001
SFR Workshop - Overview
3rd Annual SFR Workshop & Review, May 24, 2001
8:30 –
9:00 –
9:45 –
10:30 –
10:45 –
12:00 –
1:00 –
1:45 –
2:30 –
2:40 –
3:30 –
4:30 –
9:00
9:45
10:30
10:45
12:00
1:00
1:45
2:30
2:45
4:30
4:30
5:30
Research and Educational Objectives / Spanos
CMP / Doyle, Dornfeld, Talbot, Spanos
Plasma & Diffusion / Graves, Lieberman, Cheung, Haller
break
Poster Session / Education, CMP, Plasma, Diffusion
lunch
Lithography / Spanos, Neureuther, Bokor
Sensors & Controls /Aydil, Poolla, Smith, Dunn, Cheung, Spanos
Break
Poster Session / all subjects
Steering Committee Meeting in room 373 Soda
Feedback Session