新マスクCPM材料事業提案 ~事業コンセプト審議(Gate A

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Transcript 新マスクCPM材料事業提案 ~事業コンセプト審議(Gate A

FUJIFILM Thermal CtP products with ZAC system

17th,Jun,2009 FUJIFILM Corporation Graphic systems business DIV.

Contents Introduction of "ZAC system"

1. Explanation of mechanism of "ZAC system" 2. Effect of "ZAC system"

CtP Products lineup

P.2-8 P.9-12 P.13

1

ZAC system

2

Why “ZAC system” is excellent?

Because

“ZAC system” can calculate necessary replenishment .

So dot image always stable condition (

±

1.0

less at AM175L and

±

2.0

less at FM20) with minimum chemical(75% less than non ZAC).

Why?

“ZAC system” continuously checks chemical condition, and calculates required replenishment.→ You can get

minimum replenishment=min CO 2

」 How

“ZAC system” can calculates processing fatigue and carbon dioxide fatigue.

And It corresponds to environmental change.

ZAC system

How

Stable chemical condition means stable pH of chemical condition.

But measure device of pH is too expensive and difficult maintenance.

So we adopted electric conductivity device which has correlation with pH.

*Electric conductivity (EC) device is easy maintenance and reasonable price.

We developed new method of calculating electric conductivity to pH.

Why difficult? →Next.....

3

ZAC system

Why difficult?

(1)-(3)samples are same pH but all electric conductivity is not same.

Because number of K + are different.

(2)

4

(1) Only oxide neutralize (3) pH 13 pH 13 Original condition Only processing pH 13 *Actuary there are too many K + and OH .

ZAC system

"ZAC system" is considering proper electric conductivity continuously.

So you can get stable pH condition.=Stable dot

condition. Image of "ZAC system" control

5

"ZAC system" adjust chemical automatically. →You can maintenance easily.

ZAC system

Why difference of target EC and measured EC is occurred? Environmental In case of high carbon dioxide is occurred.

→For example to use heating air conditioner in winter, or when using it in a close room.

Processing In case of to many(/small) processing. →High(/low) image pattern of CtP compare with average pattern. →The quantity consumed is different day by day.

"ZAC system" can control proper condition continuously if situation is changed.

6

ZAC system

If you do not use "ZAC system".... In case of replenishment method at the passing time and processing.

7

Normally this method is decided by too much replenishment. →To waste useless replenishment and not guaranteed stable condition.

ZAC system

Image of ZAC system control unit

8

ZAC system

9

You can get stable condition with minimum replenishment !

Test result of compulsorily changing environmental condition and amount of processing.

LH-PJE+ZAC

ZAC system

You can get stable condition with minimum replenishment !

Results of our customers who adopt ZAC system.

Customer name Total

Total (L) DT-2RE(1:6)

Company A 14,708 100 Company B Company C Company D Company E Company F Company G Company H Company I Company J Company K 7,543 16,512 16,455 3,7782 28,637 23,705 5,542 75,867 31,813 8,208 170 220 380 130 410 250 60 650 280 100

TOTALS 232,772 2,750 Data represents the usage of 10 months.

ml per

㎡ 6.8

22.5

13.3

23.1

34.4

14.3

10.5

10.8

8.6

8.8

12.2

11.8

10

ZAC system

You can get stable condition with minimum replenishment !

Comparison by John Zarwan

11

75% less than Non ZAC!

8-up

1000

/month

4h on/8h standby

5days week(22days/m)

Typical operation

ZAC system

Comparison of ZAC system and non ZAC system.

12

When you process different size from the average size.

When you process different from the average image area rate.

When the amount of processing changes.

When the density of environmental carbon dioxide changes.

When the environmental humidity changes.

When the dilution rate of the developer changes.

Easiness in sensitivity setting.

Easiness of set value setting.

ZAC system

○ ○ ○ ○ ○ ○ ○ ○

Non ZAC

× × ○△ × ○△ △ × △

CtP lineup

We prepare good performance CtP products !

LH-PJE LH-PCE Developing LH-PLE Runlength Non baking/Baking UV Non/baking Dot reproduction AM300L 200K/300K FM 100K/150K TAFTA10 200K/1,000K Not available AM200L FM TAFTA20 300K/500K 100K/150K AM300L FM TAFTA10 Chemical resistance Development capacity Developer Replenishment

○ △ ○

8000m2 or 3months 1000m2 or 1months 8000m2 or 3months DT-2WE DT-2RWE HD-P8 HD-P8 DT-2WE DT-2RWE

13

Thank you for your attention.