Transcript Slide 1

NFF MCPF

Device Fabrication Facilities

Jeol JBX6300FS e_LiNE & ionLiNE Direct write on wafers, high throughput, mask writing, for nanoelectronics – 25, 50, 100 kV accelerating voltage – 2 nm minimum spot size – 12 MHz scanning rate – 150 x 190 mm write area – 0.62 nm stage movement precision – < 25 nm stitching & overlay accuracy

e_LiNE

is a ultra high resolution electron beam lithography system and nano-engineering workstation. Key applications: Lithography on 4 inch samples; Electron beam induced deposition and etching; In-situ electrical measurements and nano-manipulation, e.g. CNT or nanorods.

ionLiNE

is dedicated to ion beam nanolithography, fabrication, and engineering. Key applications: Low dose ion events; Thin film engineering; Surface fictionalization; Localized defect injection.

Laboratory Equipment List

1. Light sources: Ar + laser, He-Cd laser, Xe-lamp, Ti-sapphire fs laser.

2. Photoluminescence (PL), excitation PL, photoconductivity facilities.

3. Modulated photo-reflectance facilities.

4. Hamamatsu Streak Camera C5680 for time-resolved PL.

5. OI Spectro-Mag 4000 system: magnetic field up to 7T; sample temperature range from 5K to 300K.

6. OI Spectro-Mag 2000 system: magnetic field up to 14T; sample temperature range from 0.3K to 80K.

7. Closed cycle (10 - 300K) system for variable temperature transport and optical measurements.

8. LHe cryostat (2 – 300K) for variable temperature magneto-transport measurements.

9. LN 2 cryostat (77 – 450K) for variable temperature magneto-transport and optical measurements.

10.Various electronic equipments for transport measurements

Quantum wire resonant tunneling diode fabrication by photolithography

Structure fabricated by e-beam lithography

0.0006

sweep up B=0T 4T sweep down 0.0004

0.0002

0.0000

2 3 T=1.6K

4 Voltage(V) 5 8T 10T 12T 6 Low temperature and high magnetic field transport measurements

Low temperature magneto-photoluminescence measurements

Variable temperature magneto-transport measurements

Transport measurement facilities Oxford Spectro-Mag 2000 system (B: 0  14T; T: 0.3K

 80K)

LHe cryostat (2 – 300K, 0 – 800mT))

Magneto-optical measurement facilities Oxford Spectro-Mag 4000 system (B: 0  7T; T: 5K  300K)

Spex 1403 monochromator

Closed cycle (10 - 300K) system

Hamamatsu Streak Camera

Wavelength Time 2D image including spectra and temporal information

Electronic equipments for transport measurements