Transcript Document

Modeling TSV Open Defects
in 3D-Stacked DRAM
Li Jiang†, Liu Yuxi†, Lian Duan‡, Yuan Xie ‡, and Qiang Xu†
Presenter: Qiang Xu
†
CUhk REliable Computing Laboratory
Department of Computer Science & Engineering
The Chinese University of Hong Kong
‡
hk
l i a b l e C o m pu t i n g L a b o r a t o r y
Department of Computer Science & Engineering
Pennsylvania State University, USA
Purpose
 New test challenges for 3D-stacked DRAM
 Massive amount of TSVs that are prone to open defects and
coupling noises
 Conduct extensive simulation to study the faulty behavior
of TSV open defects
Outline
 Introduction
 Motivation
 Simulation Methodology
 Simulation Results
 Conclusion
Why 3D-Stacked DRAM?
 Ever-increasing performance gap between processor
and memory
 Excessive latency
 Limited bandwidth
 3D-stacking is a promising solution to tackle this
“Memory Wall” problem
3D-Stacked DRAM is Already Here …
NEC:
4Gb, 8 Layers
SamSung:
8Gb, 4 Layers
TSV
DRAM
4 Gbit density
TSV
Interposer
Peripherals
8 strata
3 Gbps/pin
RD/WR
I/O Buffer
PCB
“True” 3D-Stacked DRAM
One rank in
multiple layers
Separate peripheral
logic layer
Loh ISCA’08
 Much better performance when compared to using TSVs only
for buses
 TSV density is extremely high
Motivation
 TSVs are prone to open defects





Contamination
O2 trapped in bonding surface
Miss Alignment/dislocation
Mechanical failures in TSVs
Contact resistances
Voids during filling
M. Kawano, et al. IEDM’06
Motivation
Separation Cvc (fF)
(um)
1
1.16
3
0.60
5
0.42
7
0.31
9
0.25
Cgc
(fF)
0.87
0.97
1.05
1.04
1.04
I. Savidis et.al. ISCAS08
Capacitive coupling between adjacent TSVs is NOT negligible!
3D Memory Model
DRAM Layer 1
BL
d
0
Peripheral Layer V
ref
Enable 0
0
c
BL
1
To Decoder
 Write Operation
 Read Operation
TSV
1
b
1
1
a
0
Sensing
Circuit
Precharge
Circuit
Simulation Setup




SPICE simulation
Open defect represented by a very large resistance
Vdd 1.8v, Vth 0.6v
Coupling capacitance is set according to previous work
Simulation Schematic for Wordline Open
Cw WL2
C0
Ropen
Cell0
WL0
Cw
C1
WL1
Vsig
Cell1
Cw
+
-
BL
X BL
Cb
SE
Cb
SA
Output
Wordline Open
C0
C1
C3
C4
C5
C6
C7
C8
C9
WL0
WL1
WL2
WLn
BLi-1 BLi-1 BLi BLi BLi+1 BLi+1
 Access the open wordline
 Access the neighboring wordline of open wordline
 Vary wordline load capacitance
 Vary trapped charges in pass-transistor
10
Cell0
Wordline Write
 No Access to open wordline
 Access its neighboring
wordline of the (WL1)
Cell1
Cell4
Cell5
Cell7
Cell8
Cell3 WL0
WL1
Cell6
WL2
Cell9
WLn
 Write 1 to Cell4
 Write 0 to Cell4
10
01
BLi-1 BLi-1 BLi BLi BLi+1 BLi+1
 Strong write 0 (1w0),Weak write 1 (0w1)
V(1w0)
Middle
V(0w1)
Border
V-Cell0
1.2
0.8
Multiple Write
Single Write
0.4
0
0
1
2
3
4
5
6
ns
7
0
10
20
30
40
ns
50
0 0
Cell
01Cell
1
0
4
0Cell7
Wordline Read
 Multiple Access
 Two scenarios:
 Cell in the same bitline
 Cell in Complemented bitline
Cell1
Cell5
Cell8
Cell3 WL0
WL1
Cell6
WL2
Cell9
WLn
01 0
BLi-1 BLi-1 BLi BLi BLi+1 BLi+1
(Cload=200fF)
V(BLi-1)
V
1.2
V(Cell4)
Cell Access
SA
0.8
C4
C7
0.4
0
0
5
10 15 20 25 30 ns
(Vtrap>0.7V)
V(Cell0)
V(Cell7)
V
Cell Access
1.6
SA
1.2
0.8
0.4
0
0
5
10 15 20 25 30 ns
(Vtrap>1V)
Simulation Schematic for bitline Open
Ropen
SA
Cb
Cb
SA
Cb
SA
Cb
Cb
Cb
SE
+
-
Cc
Cc
Cc
Cc
Cc
Vdd
BLi-1
BLi-1 BLi
Aggressor
Victim
BLi
BLi+1
BLi+1
Aggressor
Bitline Read
Access WL0,No Error
0C4
1
C7
C0
C1
C5
0C6
C8
C9
WL0
C3
WL1
WL2
C1  BLiBLi
Access WL1,
C6BLi+1BLi
C4BLi-1BLi-1 BLi
Driving force determine the
output of open bitline
V
1.6
1.2
0.8
0.4
0
BLi-1 BLi-1 BLi BLi BLi+1 BLi+1
Vref
V
V(BLi)
1.6
BLi-1=1,BLi+1=0
BLi-1=0,BLi+1=0
1.2
0.8
BLi-1=0,BLi+1=1 0.4
BLi-1=1,BLi+1=1
0
10 15 20 25 30 ns
5 10 15 20 25 30 ns
Compatible Coupling
Competitive Coupling
V(BLi)
5
WLn
Coupling from Multiple Layer
 More complicated coupling effect
 Interference from other layer
Memory Block
Layer1
C(Ta,Tc)
Tc
Layer2
Layer3
w
Tb
TSV
Peripheral
s
C(Ta,Tb)
Ta
H
Fault Modeling
 No Access
 Multiple Access
 Coupling by neighbor
Conclusion
 The massive amount of TSVs used in “True” 3D-stacked
DRAM are prone to open defects and coupling noises
 We model the faulty behavior of open TSVs and show their
effects through extensive simulation
Thank you for your attention !