スライド 1

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Transcript スライド 1

Power supply and substrate noise analysis;
Reference tool experience with
silicon validation
Yoji Bando*1*4, Daisuke Kosaka*4,
Goichi Yokomizo*2, Kunihiko Tsuboi*2,
Ying Shiun Li*3, Shen Lin*3, Makoto Nagata*1*4
Kobe University*1, STARC*2,
Apache Design Solutions, Inc.*3, A-R-Tec Corp.*4
DAC2009-UT#8.2 -2-
Motivation
Power supply (PS) noise impacts on circuits
- digital: timing variation, leakage increase
- analog-MS: substrate crosstalk, substrate coupling
Digital PS integrity technology, with enhancements
of substrate coupling/noise analysis
On-chip measurements connect EDA analysis
with reality
DAC2009-UT#8.2 -3-
Technical contribution
Multi-party collaboration for validated noise analysis
Chip designer, IP provider, EDA tool provider
Fully integrated power and substrate noise analysis
A high capacity solver for a single large matrix unifying
on-chip power grids and current sources, chip-level
substrate meshes, and off-chip board networks
On-chip noise measurements for silicon correlation
Noise monitors with very many probing channels for
thorough correlation of simulation and measurements
Multi-party collaboration for
confidence noise analysis
DAC2009-UT#8.2 -4-
Power library: Logic
cell characterization
Dynamic and static
PS noise analysis
Integrity design tool developer
(cf. Apache Design Solutions)
Substrate network
and noise analysis
Verification planning
and test chip design
Integrity design consultant
On-chip noise meas.
and correlation
(cf. A-R-Tec)
Physical design and
sign-off flow
User company
(cf. IDM, design house)
DAC2009-UT#8.2 -5-
Key technology contributions #1
Power library: Logic
cell characterization
Dynamic and static
PS noise analysis
Substrate network
and noise analysis
Verification planning
and test chip design
On-chip noise meas.
and correlation
Physical design and
sign-off flow
PSA and SNA
DAC2009-UT#8.2 -6-
Key technology contributions #2
Power library: Logic
cell characterization
Integrated PS and
substrate noise
simulation
Verification planning
and test chip design
On-chip noise
measurements
Physical design and
sign-off flow
Simulation and
Silicon correlation
Noise evaluation chip overview
Substrate noise
probe array
in left top area
PS noise
probe array
for 32-bit mP
DAC2009-UT#8.2 -7-
5.0 mm
SRAM
macros
32-bit mP
core
Substrate noise
probe array
in right btm. area
A 32-bit processor (SH-4*) with 210 kB memory capacity
Densely distributed on-chip dynamic noise monitors
90-nm CMOS, 5LM, 1.0 V technology
SH-4* Renesas technology
DAC2009-UT#8.2 -8-
Noise probing locations in mP core
2.5 mm
32-bit uP
core
2.0 mm
DAC2009-UT#8.2 -9-
Noise probing locations on substrate
Substrate noise evaluation area
(120 probing points in total)
P+ GR
(guard ring)
deep Nwell deep Nwell
pocket
GR
1.6 mm
0.5 mm
P+ probing points
PS noise
probing array
On-chip noise monitor circuitry
Vdd
Digital Gnd
n-SF
DAC2009-UT#8.2 -10-
Iout
p-SF
Vout
Substrate (P+) noise
probing array
psub
p-SF
p-SF
Vout
n-Gm
On-chip
Off-chip
DAC2009-UT#8.2 -11-
PS noise waveform measurements
Probing @SH-4 center, Fclk = 50 MHz
Voltage (V)
Voltage (V)
1.00
0.98
0.96
0.94
Vdd
0.02 Gnd
0.01
0.00
-0.01
-0.02
200 nsec
DAC2009-UT#8.2 -12-
V (mV)
0
# test code with higher level of internal logic activity
20
Voltage
PS noise intensity: code dependence
Vnominal
Static
drop
Dynamic Vpp
40
60
40
30
20
10
0
Dynamic Vpp
#40
#39
#38
#37
#36
#35
#34
#33
#32
#31
#30
#29
#28
#27
#26
#25
#24
#23
#22
#21
#20
#19
#18
#17
#16
#15
#14
#13
#12
#11
#10
#9
#8
#7
#6
#5
#4
#3
#2
#1
80
uP Vdd Static drop
uP Gnd Static drop
Dynamic Vpp
DAC2009-UT#8.2 -13-
Unified matrix of chip-level noise analysis
PS current
sources
Off-chip networks
Vdd/Gnd grids
Vertical
impurity
profile
Silicon substrate model
Resistive as well as capacitive
elements involved
(e.g. pwell, nwell, deep well)
DAC2009-UT#8.2 -14-
Full chip PS and substrate noise analysis:
flow overview
Pkg Model
SoC Layout
Cell Library
RLC or S-Para
LEF/DEF
.lib, spice
RedHawk-EV
Substrate Model
Macro Geometry
Macro Netlist
Technology
GDSII
spice netlist
file
Digital
Totem_SE
Extraction, Simulation
Debugging, What-if and FAO
DAC2009-UT#8.2 -15-
Noise source modeling
well network
Standard cell library (LEF/DEF)
Vdd wiring
Cwell
Apache Power Library (APL)
- SPICE simulation: I(t)
LUT for in/out condition, load caps
- Post-layout extraction
logic cell level: Cesc, Resr
I(t)
Resr
Cpg
Cesc
Vss wiring
Substrate network modeling
DAC2009-UT#8.2 -16-
Noise Sources
•DGnd
•DGnd
n+ n+
p+
n+ n+
•DVdd
p+ p+ n+ p+ p+ n+
p+
p-well
Pwell RES
n-well
(in deepNwell)
Deep
n-well
•DVdd
p-well
Nwell RES
n-well
Pwell_CAP
(in deepNwell)
Pwell_CAP
(in deepNwell)
Pwell_CAP
deepNwell RES
Psub CAP
Bulk RES
Psub CAP
p-sub
DAC2009-UT#8.2 -17-
Off-chip network modeling
L
C
Off-chip power delivery network (PDN)
- FR4 board, package, bonding wires – macroscopically seen by a chip
- Lumped LCR extraction between Vdd and Gnd terminals
- Considerable impacts on noise components from DC to a few 100 MHz
DAC2009-UT#8.2 -18-
Unified matrix for quality noise analysis
Vgnd-pp (mV)
80
75
70
Substrate coupling analysis enhances
accuracy of noise analysis in digital as
well as mixed-signal circuits.
w/o off-chip model
w/o substrate model
65
60
only w/ off-chip
model
55
w/ off-chip and
substrate models
50 meas.
45
0
2 4 6
Probe point
1 SH-4
2 core
3
4
5
Ground noise in SH-4 processor @ 50 MHz,
comparing simulation with on-chip measurements
DAC2009-UT#8.2 -19-
Dynamic PS noise waveforms
(V) Vdd noise @ Fck = 50 MHz
1.00
0.98
0.96
0.94
0.92
0.90
0
20
40
(V) Gnd noise @ Fck = 50 MHz
0.08
0.06
0.04
0.02
0.00
-0.02 0
20
40
60
80
Measured
100
Simulated
(ns)
60
80
100
(ns)
DAC2009-UT#8.2 -20-
Gnd/Psub noise: chip-wide Vpp map
Simulated drop of uP Gnd/Psub
@ Fck = 50 MHz
y(mm)
Measured, left top
1000
30
900
20
800
10
700
0
600
500
yL
xU
-500
xL
-700
yR
(mV)
40
-1600 -1400 -1200 -1000 -800 -600 -400 -200 x(mm)
Measured, right bottom
(mV)
30
-600
-800
20
-900
10
-1000
y(mm)
0
0
-200 -400 -600 -800 -1000 -1200 -1400 -1600 x(mm)
DAC2009-UT#8.2 -21-
Substrate noise (Vpp) trend: yL axis
Vpp (mV)
60
xU
xL
yL
yR
Fck = 50 MHz
40
20
y-left (yL)
meas.
sim.
0
Distance -2.0
(mm)
-1.0
uP Gnd
0.0
1.0
Psub
DAC2009-UT#8.2 -22-
Substrate noise (Vpp) trend: xL axis
Fck = 50 MHz
Vpp (mV)
60
xU
xL
yL
yR
40
x-lower (xL)
meas.
sim.
20
0
Distance -1.0 0.0
(mm)
uP Gnd
1.0
Psub
2.0
DAC2009-UT#8.2 -23-
Cost of Simulation
Chip to simulate
Mesh size
CPU time
Memory usage
Machine spec.
SH-4 core: 670k gates, SRAM cells: 11.2M trs.,
# of I/O: 208 pins, chip area: 5.0 mm x 5.0 mm
750 k
extraction 1.0 h, simulation 1.5 h (for 120 nsec)
extraction 6.6 GB, simulation 3.5 GB
2-core Opteron x 2 @ 2.8GHz, 64 GB memory
DAC2009-UT#8.2 -24-
Summary
Unification of on-chip power grids, substrate, and
off-chip network realizes dynamic PS and substrate
noise simulation with high accuracy
Comprehensive on-chip noise measurements
establish reference experience of silicon validation
Close correlation of simulation and measurements
achieves designers’ confidence of noise analysis