Transcript スライド 1
Power supply and substrate noise analysis; Reference tool experience with silicon validation Yoji Bando*1*4, Daisuke Kosaka*4, Goichi Yokomizo*2, Kunihiko Tsuboi*2, Ying Shiun Li*3, Shen Lin*3, Makoto Nagata*1*4 Kobe University*1, STARC*2, Apache Design Solutions, Inc.*3, A-R-Tec Corp.*4 DAC2009-UT#8.2 -2- Motivation Power supply (PS) noise impacts on circuits - digital: timing variation, leakage increase - analog-MS: substrate crosstalk, substrate coupling Digital PS integrity technology, with enhancements of substrate coupling/noise analysis On-chip measurements connect EDA analysis with reality DAC2009-UT#8.2 -3- Technical contribution Multi-party collaboration for validated noise analysis Chip designer, IP provider, EDA tool provider Fully integrated power and substrate noise analysis A high capacity solver for a single large matrix unifying on-chip power grids and current sources, chip-level substrate meshes, and off-chip board networks On-chip noise measurements for silicon correlation Noise monitors with very many probing channels for thorough correlation of simulation and measurements Multi-party collaboration for confidence noise analysis DAC2009-UT#8.2 -4- Power library: Logic cell characterization Dynamic and static PS noise analysis Integrity design tool developer (cf. Apache Design Solutions) Substrate network and noise analysis Verification planning and test chip design Integrity design consultant On-chip noise meas. and correlation (cf. A-R-Tec) Physical design and sign-off flow User company (cf. IDM, design house) DAC2009-UT#8.2 -5- Key technology contributions #1 Power library: Logic cell characterization Dynamic and static PS noise analysis Substrate network and noise analysis Verification planning and test chip design On-chip noise meas. and correlation Physical design and sign-off flow PSA and SNA DAC2009-UT#8.2 -6- Key technology contributions #2 Power library: Logic cell characterization Integrated PS and substrate noise simulation Verification planning and test chip design On-chip noise measurements Physical design and sign-off flow Simulation and Silicon correlation Noise evaluation chip overview Substrate noise probe array in left top area PS noise probe array for 32-bit mP DAC2009-UT#8.2 -7- 5.0 mm SRAM macros 32-bit mP core Substrate noise probe array in right btm. area A 32-bit processor (SH-4*) with 210 kB memory capacity Densely distributed on-chip dynamic noise monitors 90-nm CMOS, 5LM, 1.0 V technology SH-4* Renesas technology DAC2009-UT#8.2 -8- Noise probing locations in mP core 2.5 mm 32-bit uP core 2.0 mm DAC2009-UT#8.2 -9- Noise probing locations on substrate Substrate noise evaluation area (120 probing points in total) P+ GR (guard ring) deep Nwell deep Nwell pocket GR 1.6 mm 0.5 mm P+ probing points PS noise probing array On-chip noise monitor circuitry Vdd Digital Gnd n-SF DAC2009-UT#8.2 -10- Iout p-SF Vout Substrate (P+) noise probing array psub p-SF p-SF Vout n-Gm On-chip Off-chip DAC2009-UT#8.2 -11- PS noise waveform measurements Probing @SH-4 center, Fclk = 50 MHz Voltage (V) Voltage (V) 1.00 0.98 0.96 0.94 Vdd 0.02 Gnd 0.01 0.00 -0.01 -0.02 200 nsec DAC2009-UT#8.2 -12- V (mV) 0 # test code with higher level of internal logic activity 20 Voltage PS noise intensity: code dependence Vnominal Static drop Dynamic Vpp 40 60 40 30 20 10 0 Dynamic Vpp #40 #39 #38 #37 #36 #35 #34 #33 #32 #31 #30 #29 #28 #27 #26 #25 #24 #23 #22 #21 #20 #19 #18 #17 #16 #15 #14 #13 #12 #11 #10 #9 #8 #7 #6 #5 #4 #3 #2 #1 80 uP Vdd Static drop uP Gnd Static drop Dynamic Vpp DAC2009-UT#8.2 -13- Unified matrix of chip-level noise analysis PS current sources Off-chip networks Vdd/Gnd grids Vertical impurity profile Silicon substrate model Resistive as well as capacitive elements involved (e.g. pwell, nwell, deep well) DAC2009-UT#8.2 -14- Full chip PS and substrate noise analysis: flow overview Pkg Model SoC Layout Cell Library RLC or S-Para LEF/DEF .lib, spice RedHawk-EV Substrate Model Macro Geometry Macro Netlist Technology GDSII spice netlist file Digital Totem_SE Extraction, Simulation Debugging, What-if and FAO DAC2009-UT#8.2 -15- Noise source modeling well network Standard cell library (LEF/DEF) Vdd wiring Cwell Apache Power Library (APL) - SPICE simulation: I(t) LUT for in/out condition, load caps - Post-layout extraction logic cell level: Cesc, Resr I(t) Resr Cpg Cesc Vss wiring Substrate network modeling DAC2009-UT#8.2 -16- Noise Sources •DGnd •DGnd n+ n+ p+ n+ n+ •DVdd p+ p+ n+ p+ p+ n+ p+ p-well Pwell RES n-well (in deepNwell) Deep n-well •DVdd p-well Nwell RES n-well Pwell_CAP (in deepNwell) Pwell_CAP (in deepNwell) Pwell_CAP deepNwell RES Psub CAP Bulk RES Psub CAP p-sub DAC2009-UT#8.2 -17- Off-chip network modeling L C Off-chip power delivery network (PDN) - FR4 board, package, bonding wires – macroscopically seen by a chip - Lumped LCR extraction between Vdd and Gnd terminals - Considerable impacts on noise components from DC to a few 100 MHz DAC2009-UT#8.2 -18- Unified matrix for quality noise analysis Vgnd-pp (mV) 80 75 70 Substrate coupling analysis enhances accuracy of noise analysis in digital as well as mixed-signal circuits. w/o off-chip model w/o substrate model 65 60 only w/ off-chip model 55 w/ off-chip and substrate models 50 meas. 45 0 2 4 6 Probe point 1 SH-4 2 core 3 4 5 Ground noise in SH-4 processor @ 50 MHz, comparing simulation with on-chip measurements DAC2009-UT#8.2 -19- Dynamic PS noise waveforms (V) Vdd noise @ Fck = 50 MHz 1.00 0.98 0.96 0.94 0.92 0.90 0 20 40 (V) Gnd noise @ Fck = 50 MHz 0.08 0.06 0.04 0.02 0.00 -0.02 0 20 40 60 80 Measured 100 Simulated (ns) 60 80 100 (ns) DAC2009-UT#8.2 -20- Gnd/Psub noise: chip-wide Vpp map Simulated drop of uP Gnd/Psub @ Fck = 50 MHz y(mm) Measured, left top 1000 30 900 20 800 10 700 0 600 500 yL xU -500 xL -700 yR (mV) 40 -1600 -1400 -1200 -1000 -800 -600 -400 -200 x(mm) Measured, right bottom (mV) 30 -600 -800 20 -900 10 -1000 y(mm) 0 0 -200 -400 -600 -800 -1000 -1200 -1400 -1600 x(mm) DAC2009-UT#8.2 -21- Substrate noise (Vpp) trend: yL axis Vpp (mV) 60 xU xL yL yR Fck = 50 MHz 40 20 y-left (yL) meas. sim. 0 Distance -2.0 (mm) -1.0 uP Gnd 0.0 1.0 Psub DAC2009-UT#8.2 -22- Substrate noise (Vpp) trend: xL axis Fck = 50 MHz Vpp (mV) 60 xU xL yL yR 40 x-lower (xL) meas. sim. 20 0 Distance -1.0 0.0 (mm) uP Gnd 1.0 Psub 2.0 DAC2009-UT#8.2 -23- Cost of Simulation Chip to simulate Mesh size CPU time Memory usage Machine spec. SH-4 core: 670k gates, SRAM cells: 11.2M trs., # of I/O: 208 pins, chip area: 5.0 mm x 5.0 mm 750 k extraction 1.0 h, simulation 1.5 h (for 120 nsec) extraction 6.6 GB, simulation 3.5 GB 2-core Opteron x 2 @ 2.8GHz, 64 GB memory DAC2009-UT#8.2 -24- Summary Unification of on-chip power grids, substrate, and off-chip network realizes dynamic PS and substrate noise simulation with high accuracy Comprehensive on-chip noise measurements establish reference experience of silicon validation Close correlation of simulation and measurements achieves designers’ confidence of noise analysis