Transcript Ultimate 3D e-beam lithography for nano/micro

Ultimate 3D e-beam lithography
for nano/micro-structuring with
NanoMaker
INTERFACE Ltd, Moscow
IMT RAS, Chernogolovka, Moscow Region
rev. 2015
Preview
The NanoMaker is a powerful lithography system for
electron and ion beam lithography using a commercial
SEM, FIB or dual beam microscope. The NanoMaker
solutions comprise modern Pattern Generator hardware
and versatile data preparation software which allow both
design and nanofabrication. It provides friendly graphic
interface to create and design structures of nano-size as
little as 10 nm based on e-beam lithography method for
SEMs, make simulation of resist exposure, calculate
exposure dose values/times in correlation with proximity
effect correction for 2D/3D structures, compensate static
distortion of e-beam deflecting system, significantly
reduce total exposure time by reading and actively
suppressing dynamic distortion of e-beam deflection.
NanoMaker system is developed and launched as
commercial product by Interface Ltd.
NanoMaker system is a result of long and fruitful
cooperation with a team of scientists based on IMT RAS,
Chernogolovka, Moscow Region, Russia
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Goals
Families of
Microscopes
JEOL
Zeiss
FEI
Hitachi
Tescan
Leo
Focused Ion Beam
and Dual Beam
machines
and others…
NanoMaker
Lithography
systems
The goal of NanoMaker is to achieve with a conventional
microscope maximum resolution capacity in lithography
mode. Practically it means to convert a standard lab
electron microscope into a full-functionality e-beam
lithography system by fitting software and hardware to
control electron beam by compensating dynamic and
static errors of deflection system.
Just note that price for scanning electron microscope
starts from USD 100,000.00 and price for fullfunctionality e-beam lithography system starts from USD
1,000,000.00
Cost starts from
USD 100,000
Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Cost starts from
USD1,000,000
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NanoMaker purpose
NanoMaker is a unique complex, which facilitates Scanning Electron Microscopes to
obtain the ultimate resolution and compensate inaccuracies of microscope
characteristics. It is developed:
– to create and design structures of various geometry forms and of nano-size as little
as 10 nm to be exposed by e-beam lithography method
– to work with 2D and 3D structures in resist, create multilevel structures
– to overcome proximity effect appearing when micro- and nano- structures are
exposed including 2D and 3D structures
– to compensate static distortion of e-beam deflecting system by calculation methods
– to significantly reduce total exposure time by measuring and actively, “on-the-fly”,
compensating dynamic errors of e-beam deflection
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
NanoMaker purpose (continued)
- to simulate results of resist development by matching exposure dose and time
parameters to provide 100% of known-good output
- to provide programmable control over cooperative movement of beam and stage,
involving the blanking system as well
- to provide compatibility with other graphic software systems to import and export other
known formats for images and support various types of SEMs, FIBs, lithographs, etc.
equipment
- to support operations of scanning metrology microscopes and to work with fields,
markers, video, etc.
- to provide image acquisition and carry out processing for fields alignment and stitching
- to work with large fields and provide seamless stitching of images
Some of the features are unique and are not available in the market
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
To provide capabilities
of lithography systems
Pattern
Generator
To control blanker
To control e-beam position
Image acquisition
To control stage
NanoMaker consists of
two main parts: Pattern
Generator and Software
modules.
Pattern Generator is to
control the exposure
process by
sending/receiving signals
to/from microscope as it
is sketched on the slide.
Software modules are
intended to solve a
number of tasks
depending on
requirements to be
mentioned further.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
NanoMaker hardware
Pattern Generator Elli30 PCIe
Hardware comprises two units: analogue unit and digital unit
Analogue unit is a separate box with its own stabilized power
supply unit.
Digital and Analogue units are connected by two fiber optic
cables to provide high speed noise protective data transfer.
Digital unit is a PCIe Board Controller.
The Pattern Generator carries:
• Two 16-bit Digital-to-Analogue Converters (50 MHz DACs )
• One 8-bit Analogue-to-Digital Converter (ADC)
• Beam Blanker On/Off switch (TTL output level)
• Internal/External scan mode switch (TTL output level)
Output XY DACs and input ADC signals can be tuned for arbitrary intervals in
±10 V range.
Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
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To provide capabilities
of lithography system
NanoMaker provides integrated
development environment to
create structures and design
data
NanoMaker provides functions
to control exposure and stage
operations.
NanoMaker provides functions
to acquire marker’s images, to
recognize them and to write
structures under alignment
control
NanoMaker provides functions to compensate inaccuracies of
microscope and improve lithography yield, i.e. :
• compensates distortion and dynamic errors
• calculates proximity effect correction
• makes simulation and predicts the results of exposure
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
NanoMaker solutions
.
NanoMaker system can be supplied to the end user in various combinations:
NanoMaker-Full
to createNanoMaker-Writer
andNanoMaker-Workbench
design structures of–nano-size
little
–as
module
combination
of
theas 10 nm
to design
2D and 3D
structures,
on e-beam
lithography
method
SEMs,
Patternbased
Generator
andNanoMaker-Full
software
that allows
tofor
use
a microscope
solve NanoMaker
a problem of proximity
effect
correction
complete system and
for lithography
It issimulation
this
stage
when
conversion
to lithograph
make
of
resist
exposure,
to tasks.
have
output
data
in formats
(GDSII,
DFX,
ELM…) is done
fully solves the task to convert
byachieve
most graphical
brands
existing
lithographs.
and thecalculate
bestacceptable
resolution
to
properoflithography
qualitywith
is possible.
NanoMaker-Editor
is exposure
fully featured
editor
of
lithographic
structures
dose
values/times
in correlation
NanoMaker-Workbench
The
inverse
ofmicroscope
data in
is and
also
possible.are:
scanning
with some
limitations
ofoftransformation
export
possibilities
unregistered
version.
The main
functions
the electronic
Pattern
Generator
software
proximity
effect
correction
formentioned
2D/3D structures,
It
means
that
data
released
in
above
formats
Others functions
can
simulated
for parameters
training purposes.
intobe
e-beam
lithograph
• to control
important
microscope
can
be
further
corrected
or
re-designed
compensate static distortion of e-beam deflecting system,
NanoMaker-Writer
• to exported
assign
beam
(DAC),
and
backposition
in the same
format.
significantly
reduce
total stage
exposure
time by
readingmode
NanoMaker-Workbench
allowsposition
to work
in off-line
• to control
and directly
actively
suppressing
dynamic
(without
being
connected
a scanning
microscope).
• to
take
image at
the giventolocation
(ADC),
NanoMaker-Editor
of e-beam
deflection
• todistortion
switch
on/off
the e-beam
blanker
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Interface Ltd. www.nanomaker.com
NanoMaker
software modules diagram
Recommended Parameters Database
Postprocessing
·
Negative, Union, Frame, Shrink,
Erase, Stratification, Overlaps out…
Exposure (Writing )
Editor (Specialized 2D/3D CAD)
-Design of (hierarchical
/ multilayered ) structure
·
-Load / Save Graphical Data Base (GDB) files
-Import/Export GDS, DXF, ELM formats ·
Proximity & Simulation
Proximity Effect Correction
Exposure & Development Simulation
With Alignment&Compensation
for Static/Dynamic
deflection errors
·
Pattern Generator
Alignment & Adjustment (Working with Video)
-Scan Field Alignment Using Test Pattern or Stage
-Stage Adjustment to Test Pattern or to Scan Field
-Image Acquisition
Stage Control
-Stage Driver
SEM inaccuracies characterization for active compensation
-Dynamic ( measurement of deflection system dynamic errors )
-Distortion ( measurement of deflrction system static errors )
NanoMaker-Workbench
NanoMaker-Writer
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Practical implementations of modules
OFFLINE MODE
Import
of
structures
*.DXF,
NanoMaker-Workbench
Data designing or
redesigning
*.CSF,
ONLINE MODE
NanoMaker-Writer
Export
of data
*.GDS,
*.TIF,
*.BMP and
Designing own
holograms
structures
with
complex
topography
up to
100 Mgb
Or transfer
of structures
Pattern
Generator
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Unique features of NanoMaker
In the market of similar software unites NanoMaker offers unique features:
Proximity effect correction for 2D and 3D structures
Simulation of resist development
"Distortion compensation" - compensation of static distortions of
deflection system
Measurement and active compensation of dynamic distortions of
deflection system and as a result – possibility to exposure without
beam blanker
Advantage features for hologram/kinoform applications
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Proximity effect
Proximity effect correction is especially important for closely packed, differently sized pattern
elements. Though it is applicable to simple structures as well. The proximity effect becomes
apparent in small enough areas when forward and backward scattering takes place in the
substrate and leads to overexposure, thus resulting in breaking the accuracy of the structure.
is depicted
the slide.
In the figureThis
it isfact
depicted
an ine-beam
The
resulting
radiation
dose
redistribution
in resist

e-beam
e-beam
width
width
when
when
leaving
exposed
to a chip.
––0 –
e-beam
width
when
reaching
is known as proximity function
resist.
reaching
It chip
defines
resist
actually
exposed
The
consists
of
substrate
covered with resist.
substrate
and has the following values of parameters:
Initially the e-beam
was of
focused.
area
 - fractions
micron,
However when0it–permeates
both-way
hundredths of micron,
trough substrate
resist,
- and
microns.
The factscattering
is the moretakes
e-beam
energy the more
electron
place.
disproportion
is.
As a result radiation dose
is disproportioned
The value of disproportion is as well subject to
and final exposed area () is significantly
parameters of substrate and resist.
more than
it was
initiallyof(the
0) assigned.
To the
convenience
users NanoMaker
offers its own integral database of Recommended
Parameters.
It enables to fast match assignments of parameters.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Z
How Proximity effect works
Simple exapmple to demonstarte the impact of proximity effect
An elementary structure is shown. The
total area is about 20 micrometers. The
structure resembles field-effect transistor
(FET). It consists of two rectangulars and
has a line of 0.2 micrometers width. All
gaps between elements are of the similar
width (0.2 micrometers). The circuit is
designed on Silicon chip with accelerating
voltage of 25 Kilo electro Volt.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
How Proximity effect impacts
If proximity effect is not corrected then the result coud be depicted this way
Simulation
Photo of the exposed pattern
The fact the top line is missing is due to insufficient radiation
dose, contrary, excessive dose resulted in gaps vanishing
between rectangular.
Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
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How proximity effect is corrected
NanoMaker provides function to calculate the
dose distribution along the area.
Figure shows the areas depicted by isolines,
which highlight the zones with uniform
characteristics. In our case it means that each
zone has ascending dose from 105% up to
125% against 100% initial dose .
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Result of proximity effect correction
After simulation shows satisfied results
exposure is done
100% of known-good output
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Simulation proximity effect and resist
development
One more unique feature of NanoMaker is possibility to output the lithography
image simulated in the screen. It is possible to assign and alter various
dose/time parameters and then follow it with preview in the screen as if resist
development has taken place.
In the preceding figures we can notice the coincidence with the experimental
data obtained. This way simulation process effects in saving time and physical
resources.
We have to note that resulting accuracy of proximity effect correction is very
much subject to accuracy of assigned parameters. Wrongly assigned, from
accuracy point, parameters can even increase distortion effect. That is why
NanoMaker maintains the database of Recommended Parameters for most
common types of substrate.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Sample of proximity effect correction
for 3D structure
Presently the problem to create 3D structure with e-beam lithography, say for
optical applications, comes into consideration more and more often
Simulation ofeExposure dose.
Iisolevels after correction
Topographic expression of 3D structure
An AFM image of a relief of transparent polymer DOE
after copying from metal replica.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Example of creating 3D structure
Kinoform optics
Using 3D proximity
correction and electron
lithography, objects
with arbitrary 3D shape
could be created with
single exposure session.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Distortion compensation (static)
One of the significant NanoMaker function is capability to compensate distortions, both static
distortion of deflection system and dynamic distortion of e-beam long jump.
The static distortions arise from electromagnetic lenses
imperfection.
Ideal shape of
scanning
Actual shape of canning
NanoMaker provides with a function to measure the
distortions of microscope operative field and store the
values of deviation from pattern grid. These values are
used for calculation of e-beam trajectory to meet the
parameters of a given pattern grid.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Distortion compensation (dynamic)
NanoMaker/Writer provides with one more absolutely unique feature to
measure and carry out active compensation of dynamic distortions of
deflection system.
NanoMaker
solution
Common solution
-No
blanker
system
is required
-Use
blanker
system
when structure is written in one
-Wait till e-beam is
field
settled at the point
- Compensate distortion by
addressing to the trajectory
resulting into ideal line
Result
Calculated
Waiting
timeexposure
usually exceeds
time is
pure time
exposure
of total
time
exposure
several
times
process
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Example of distortion compensation
The structure with long jump of e-beam
No compensation
With compensation
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Alignment
This function enables to make lithography of complex multi-layer structures.
It enables:
– acquire an image of existing lithography layers and recognize
markers in automatic or semi-automatic mode
– rotate, zoom and shift the image
– align a new layer with existing objects of the image as per given
markers
– make exposure in a new coordinate frame
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Alignment (example)
Here we will demonstrate how it works on the
samples prepared with the NanoMaker alignment
function.
In the figure shown gold contacts along with
markers were done with optical lithography tools.
With the help of NanoMaker the dimensions of gold
contacts were measured, depicted and aligned with
the given layers and whereupon they were pickled
in hetero-structure on GaAs.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Alignment consequence
First optical lithography
a)
With
NanoMaker
the
dimensions of gold contacts
were measured, depicted
and aligned with the given
layers and whereupon they c)
were pickled in heterostructure on GaAs.
Placing metallic ferromagnetic
material in the places marked
by cross lines.
b)
d)
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
World market
Nearest competitors
The nearest competitors at the market are:
-NPGS
-Raith GmbH
We refer to the book: Micro-lithography, Micromachining and Microfabrication (ed.
P Rai-Choudhury),Volume1: Microlithography, Section 2.5, written by M. McCord
and M. Rooks. Web ref: http://www.cnf.cornell.edu/cnf_spie54.html
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
World market
Interface Ltd.
JC Nabity ***
Lithography Systems
Raith GmbH
Functionality
NanoMaker, Elli30 PCIe
NPGS, ver. 9
Elphy-Plus or Elphy-Quantum
Proximity correction
Yes
No
Yes
Development simulation
Yes
No
Yes
3D**** structure editor
Yes
No
No
Alignment **
Automated or manual
Automated or manual
Automated or manual
Stitching
Automated, accuracy limited by
stage
Automated, accuracy
limited by stage
Automated, 0.1 um accuracy with laser
stage
Energy
0-40 kV for typical SEM, but
depends on target instrument
0-40 kV for typical SEM,
but depends on target
instrument
0-40 kV for typical SEM, but depends on
target instrument
DAC speed
Fast, 50 ns per exposure point (20
MHz)
Mid-range, 0.2 us per
exposure point (5 MHz)
Mid-range, 0.16 us per exposure point (6
MHz) for Elphy-Plus
Stage
Support for any automated stage
Support for any
automated stage
optional laser controlled
Control computer
PC compatible,
PCIe bus, OS Windows
PC compatible,
PCI bus, OS Windows
PC compatible,
PCI bus (Elphy-Quantum),
OS Windows
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Resume
NanoMaker – is a commercial product that can be
customized as per customer’s requirements
•The main purpose of NanoMaker system is to convert conventional
electron microscope into lithography system
•Successfully defined and solved Proximity Effect Correction problem
for 2D and 3D structures that enables to fulfill designing and simulation
•Unique functions are developed and implemented
 Proximity effect correction for 3D structures
 Static distortion compensation
 Dynamic error correction
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Photo Gallery (Cantilever needle)
The examples of integration of NanoMaker into AFM are shown at the slides as
possibility to grow up tips for cantilevers with high accuracy. Actually this is an
unique technique which is used for industrial needs. The process is done in the
standard work chamber.
Front
This technique is used in
manufacturing probes/sondes
and calibration standard for
scanning sonde microscopy.
NanoMaker enables to grow up
the tip of a standard silicon
cone tip and get tip with
diameter of 100-200 nm and
length up to unites of
micrometer.
Side view
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Photo Gallery (Implementation for
fun)
Imitation of gecko paws
performed in lab with
JEOL - 840
Nature Materials - published
the photo to illustrate
macroscopic adhesive
properties by showing a
spider-man toy clinging with
one of its hands to a horizontal
glass plate. The toy (15 cm
high; weighing 40 g) has its
hand covered with the
microfabricated gecko tape,
which provides a 0.5 cm2
contact with the glass and a
carrying capacity of >100 g.
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Photo Gallery (Nano World)
The
smallest
map of the
world.
The width
of line is
10 -20 nm
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker
Contacts
We thank you for your attention
Please visit our site www.nanomaker.com
Contact us at e-mail: [email protected]
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Ultimate 3D e-beam lithography for nano/micro-structuring with NanoMaker