Transcript EDI 连续电再生除盐技术

EDI 连续电再生除盐技术
EDI 技术介绍
Water purification without regeneration
chemicals:
水的纯化，勿需化学再生药剂：
A 、 Reverse Osmosis replaces primary
catio/anion exchange
反渗透 技术已取代了原来的阳，阴床
B 、 Electrodeionizat replaces primary
mixed bed ion exchange
EDI 技术正在取代原来的混床
EDI 技术的演变
流程图：
酸
碱
预处理
阳床
阴床
混床
酸
碱
预处理
反渗透 R.O.
混床
预处理
反渗透 R.O.
E-Cell
混床和EDI的比较
进水
产品水
失效层树脂
有效工作层
E-Cell 模 块
保 护层 树脂
进水
产品水
清达康产品流程图
产品模块结构
系统的工作过程
Ion exchange occurs as per usual kinetic &
thermodynamic factors
由于常规的动力学和热力学因素而发生的离子
交换反应
• Ions in the IX resin migrate toward the
electrode,
through IX membranes and into concentrating
chambers
离子交换树脂中的离子向电极方向迁移，通过离子交换
膜到达浓水室
• Water splitting produces H+ and OH- ions
...resulting in continuous regeneration
水分解成氢根和氢氧根， 使其不断地再生
离子交换
H+
OH-
Resin
Resin
Na+
Cl-
离子的迁移
_
Resin
OHCl-
阴级
Na+
+
H+
Resin
阳极
水的分解和再生
Na+
Resin
ClResin
H+
OHH+ H+ OHOHH+
OHH2O
浓水室
阴膜
阴
极
-
阳膜
淡水
室
OH- OHClOH-
H+
Na+
H+
H+
OH
ClOH
OH
OH浓水室
Ca+
H+
H+
Na+
H+
淡水室
+
阳
极
+
浓 水室
阳膜
阴膜
淡水室
ClOH-
Na+
阳 离 子 不 能 通 过 H+
阴离子交换膜
淡水室
阴离子不能通过
阳离子交换膜
不同的 P H 属性
• 3 to 10 times the number of H+ and OH- ions as other
EDI中氢离子和氢氧离子的含量是其它离子总和的3到10倍
• Concentrate chamber side of Cation membrane is at low pH (many
H+ ions) 浓水室阳膜一侧 P H低
• Concentrate chamber side of Anion membrane is at high pH (many
OH- ions) 浓水室阴膜一侧 P H高
• Extreme pH levels can facilitate scaling!
过高的 P H 值会导致结垢
• High velocity in C chamber minimizes scaling
• 在浓水室保持高流速，可抑制结垢
EDI 工作过程总结
• Ion exchange removes contaminant ions from water.
•
•
•
•
•
离子交换法去除水中的离子
Contaminant ions and H+ and OH- move through resin
and membranes to C chambers under influence of the
electric field. 在电场作用下H，OH和离子树脂和膜到达浓
水室
Ions are trapped in C chambers. 离子在浓水室里聚集
Scaling can occur if design limits exceeded.
如果设计超过极限，会导致结垢生成
Electrode (E) flow is sent to waste due to chlorine and
hydrogen gas. 极水中有氯气和氢气生成 全部排放
All energy ends up as heat - minimum flows must be
observed. 由于有热量散发，所以进入EDI的水量必须大于
安全值
EDI 的特性
Time
16:31
16:03
15:34
15:06
14:37
14:09
13:40
13:11
12:43
12:14
11:46
11:17
40
10:48
45
10:20
9:51
9:23
8:54
Resistivity/Conductivity
Variable Feed Water,
Constant Current
50
uS/cm
Mo-cm
35
30
25
20
15
10
5
0
Product Resistivity(Mohm cm)
Product Resistivity vs. Feed Conductivity At
Varying Currents
18
16
14
12
10
8
6
4
2
0
1.0 Amps
2.0 Amps
3.0 Amps
4.0 Amps
5.0 Amps
0
Life @ 2.0
Amps
Life @ 3.0
Amps
20
40
60
Feed Conductivity (uS/cm)
80
100
Case study: EDI Test SystemTM at TVA
Brown's Ferry Nuclear Plant
• In collaboration with Ecolochem
• Existing 200 gpm (45 m3/h) system
• Install 100 gpm (23 m3/h) EDI SystemTM
...divert 50% of RO product into EDITM
• Operated by client water technician
TVA BROWN’S FERRY
Media Filter
Softener
Carbon Filter
Divert Valve
200 gpm (46 m3/h)
RO
100 gpm (23 m3/h)
E-CellTM
Effect of Pre-RO Injection of NaOH
Resistivity
No NaOH
Injection
14 Mohm.cm*
CO2
8-10 ppm
TOC
SiO2
850 ppb
55 ppb
NaOH injection
17.8 Mohm.cm* <1.25 ppm 110 ppb
(pH=8)
51 ppb
*Resistivity readings are approximate
20.0
18.0
16.0
14.0
12.0
10.0
8.0
6.0
4.0
2.0
0.0
20.0
18.0
16.0
14.0
12.0
10.0
8.0
6.0
4.0
2.0
0.0
Product Resistivity
Recovery following
current interruption
Feed Conductivity
0
10
20
30
40
50
Time (hours)
60
70
80
Feed Conductivity
(uS/cm)
Product Resistivity
(MOhm.cm)
100 gpm E-Cell at TVA Brown's Ferry Nuclear Plant
Pilot EDI SystemTM
TVA Brown’s Ferry Nuclear Plant
Feed Water
E-CellTM
Product
TVA
Specification
5.5 - 6.0 uS/cm
17.8-18.0 Mohm.cm
(0.056 uS/cm)
>16.7 Mohm.cm
(<0.06)
4.06 ppb SiO 2
<5.0 ppb SiO 2
30-32 ppb TOC
<50 ppb TOC
55.0 ppb SiO 2
110-120 ppb TOC
Case Study:EDITM Pilot System at
Semiconductor Plant (U.S.A.)
Existing primary DI loop
24 hour continuous operation
100 gpm (23 m3/h) E-CellTM System
100 gpm E-CellTM System at Semiconductor Plant
20.0
2.5
Product Resistivity
16.0
2.0
14.0
12.0
1.5
10.0
Feed Conductivity
8.0
1.0
6.0
4.0
0.5
2.0
0.0
0.0
0
100
200
300
400
Time (hours)
500
600
700
Feed Conductivity (uS/cm)
Product Resistivity (MOhm.cm)
18.0
EDI StacksTM
EDI StacksTM 模块
MK-2
最新工业用EDI模块
可应用于电子，医药，电力 等行业
7.2 to 15 gpm/stack (1.6 to 3.4 m3/h)
MK-2Mini
迷你型EDI模块，小流量和实验室使用
2.5 to 5.0 gpm/stack (0.57 to 1.14 m3/h)
MK-1E
常规EDI模块， 现仅用在现有系统中模块的更换
6.0 to 15.0 gpm/stack (1.36 to 2.8 m3/h)
Feed Water Specifications
EDI 进水要求
Constituent Units
TEA
ppm
Conductivity uS/cm
pH
Hardness
ppm CaCO3
Silica(reactive) ppm
TOC
ppm
Free Chlorine ppm
Fe, Mn, H2S ppm
SDI 15 min
MK-2
<25
<65
5 to 9
<1.0
<0.5
<0.5
<0.05
<0.01
<1.0
MK-1E
<16
<40
5 to 9
<0.05
<0.01
<1.0
<0.5
<0.5
<1.0
Operating Parameters运行参数
Parameter
进水温度 T
进水压力 P
进水压差 Pressure Drop
Range
40 to 100°F (5 to 38°C)
45 to 100 psi (3.1 to 6.8 bar)
20 to 35 psig (1.4 to 2.4 bar)
回收率 R1－ STACK
回收率 R2－ SYSTEM
80 or 90%
可 达 到 97％
（ 浓水排放到 RO 前的水箱 〕
Operating Parameters运行参数
Stack
MK-2
Maximum Power
Up to 600 VDC
1.5 to 4.5 amps
MK-2Mini
Up to 400 VDC
1.5 to 4.5 amps
MK-1E
Up to 600 VDC
1.5 to 4.5 amps
EDITM Cleaning有关清洗
EDI Cleaning 清洗
Over time, or under certain upset conditions,EDI
StacksTM and plumbing may foul with:
长期运行，或者在某种不确切工作状态下，EDI
模块和管件可能会
由于以下原因行成污堵
•
•
•
•
Hardness scaling
Biofouling
Organic matter
Metal oxides
结垢
生物污染
有机物
金属氧化物
EDI Cleaning清洗
A Few Causes of Fouling 照成污堵的其它原因
• Feed water does not meet requirements ex. hardness >
1 ppm
EDI 进水没有达到要求， 比方说硬度大于1PPM
• Recovery too high
回收率太高
• Storage of Stack or shutdown of E-Cell SystemTM greater
than three days without storage / long term shutdown
procedure followed
EDI 模块的存放 或者 EDI 长期不运行时，没有按规定对其保护
Symptoms of Fouling污堵的症状
• High Stack pressure drop / low product, concentrate or
electrode flow 如果 压差增大，产品水，浓水或极水减少
– Hardness or metal oxide scaling硬度或金属氧化物结垢
– Biofouling 生物污染
• High voltage 如果 电压增高
– Hardness or metal oxide scaling硬度或金属氧化物结垢
• Low product quality 如果产品水质下降
– Hardness or metal oxide scaling硬度或金属氧化物结垢
– Biofouling 生物污染
– Organic fouling 有机物污染
Note: If both hardness and organic/biofouling are
suspected, both the acid and sodium chloride / sodium
hydroxide cleanings must be done in sequence.注意，当
硬度和有机污染生物污染同时发生，那么酸和氯化钠以及
氢氧化钠 须同时按顺序清洗
Four Cleaning Procedures
四种清洗方法
• Sodium Carbonate / Hydrogen Peroxide (Sodium
Percarbonate Solution)
To clean organic
matter, and to sanitize 碳酸钠和过氧化氢 － 清洗有机物
和消毒
• Sodium Chloride / Sodium Hydroxide Solution
To clean out organic matter
氯化钠 和 氢氧化钠 － 清除有机物
• Peracetic Acid 过乙酸
To sanitize
消毒
• Hydrochloric Acid
To remove hardness scale and metal oxides
盐酸 － 除垢，除金属氧化物
Cleaning Connections
Hydrochloric Acid 盐酸
Hydrochloric acid 1.8% is useful for removing
hardness scale and metal oxides. Cleaning is
done in three steps.
用1。8％的盐酸清洗EDI系统以去除结垢和金属氧
化物，清洗分以下三个步骤
• Hydrochloric Acid Solution
加盐酸溶液清洗
• Salt Solution Recirculation: 5% NaCl
用百分之五的氯化钠溶液再打循环
• Water Rinse
纯水洗净
EDI 进水中硬度的控制
Install softener before E-Cell:
在 EDI 前安装软化器
Feed flow rate: 3.4 m3/h per MK－2 Stack.
每个MK－2 模块的进水流量为15GPM
Run softener at 40 gpm/ft2 (96 m/h).
软化器的流速为 96米 每小时
Requires 0.04 m2 of bed surface area per MK－2 stack.
对每个MK－2 模块， 软化器的截面积为0。04平方米
A 3 foot (0.9 m) deep bed implies 1 ft3 (28 liters) of
resin per stack with a service run of 8.5 days if feed is
3ppm hardness as CaCO3.
如果进水中硬度是3PPM，那么28升阳树脂放在0。9米高
的软化器中， 可对一个MK－2模块EDI系统进行8。5天的
软化