Transcript Etch and Plating Resist
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Etch / Plating Resist
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What is resist A photo resist is a chemical product that, under the influence of UV light, changes its chemical nature.
Resist without UV: is washed away during resist development Resist with UV: is NOT washed away during resist development protects the copper in the etch batch is stripped away after etching
Remark:
1 Etch resist: print & etch of inner layers 2 Plating resist: print, plate & etch of outer layers Eric Janssens May 2013 Slide 2 a b
What is resist
Liquid photo resist (20%)
• Curtain, roller- or spray coated • Thickness: 5 - 20µm • Pro: high resolution • Contra: dust inclusions and chemical sensitivity
Dry photo resist (80%)
• Cold, hot or wet laminated • Thickness: 25 - 75µm • Pro: high yield and good tenting • Contra: line width Eric Janssens May 2013 Slide 3 Tenting: Via’s must be tented to avoid resist getting in the via a b
Traditional resist printing
Workflow:
• Design • Image and develop film, check • Coat, laminate resist • Image resist • If laminated: peel cover layer • Develop resist • Etch • Strip
Working with resist is:
• A time consuming process step • Expensive • Fixed data • Ecological unfriendly Eric Janssens May 2013 Slide 4 a b
Inkjet resist printing
Principle:
• apply etch / plating resist • directly on the panel • using a set of Inkjet nozzles mounted on a XY table • ie without the use of a phototool or screen
Workflow:
• Design • Print (with pin curing) • Curing (thermal and/or UV) • Etch • Strip Eric Janssens May 2013 Slide 5 a b
Inkjet resit printing
Advantages:
• Reduce cost - no phototool, less production steps - shorter production cycle, higher yields • Registration panel per panel / distortion compensation - front-to-back - outer layer to inner layer • Design changes & variable data per board • Fast (no set up) • Ecology Eric Janssens May 2013 Slide 6 a b
Quid May 2013
R&D project is in progress
Jetability and etch resistance: OK
Stripability: concepts are tested
Planning
• One ER fieldtest in operation by end 2013 • Proliferation of ER in 2014 • Concept study PR Eric Janssens May 2013 Slide 7 a b
Quid May 2013
Eric Janssens May 2013 Slide 8 a b
Quid May 2013
Eric Janssens May 2013 Slide 9 a b
Quid May 2013
Eric Janssens May 2013 Slide 10 a b
Competition: Dow (Rohm and Haas)
www.dowelectronicmaterials.com
Eric Janssens May 2013 Slide 11
Phase shift ink
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Competition: MacDermid
www.macdermid.com
Eric Janssens May 2013 Slide 12 a b
Competition: MuTracx
www.mutracx.com
Spin-off from OCE Technologies (Canon)
Announces Lunaris: print system and etch resist for IL
Phase shift inkl
Uses Predict
Fieldtest summer 2010 in EU
Commercially available by mid 2011
Eric Janssens May 2013 Slide 13 a b
Competition: MuTracx
Eric Janssens May 2013 Slide 14 a b
System supplier: MuTracx
lunaris animation.avi
Eric Janssens May 2013 Slide 15 a b
Conclusion
Inform your customers and prospects on our plans Gather as much information as possible Eric Janssens May 2013 Slide 16 a b