Parylene Tutorial
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Transcript Parylene Tutorial
Outline
Parylene Properties
Deposition of Parylene
Parylene Etching
Properties of Parylene
Parylene, a white granular powder, is a generic name for a class of polymers called
Poly-Para-Xylylene.
Parylene material was discovered by M. M. Swarc in 1947 and it was
commercialized by W. F. Gorham in 1965.
Based on how the aromatic or aliphatic hydrogen atoms are replaced with other
atoms or chemical groups, parylene is classified into 20 types
However, only 4 of them are widely in parylene N, C, D and F
Parylene-N
Parylene-C
Parylene-D
Parylene-F
Properties of Parylene
Parylene does not produce any out-gassing, and has low permeability to
moisture and gases.
Deposited at room temperature
Compatible with silicon micromachining
As deposited it is hydrophobic (water contact angle of ~98)
But can be made hydrophilic with a short plasma treatment (ca ~ 10 )
It has high tensile strength (10,000psi) and high mechanical strength
(Young’s modulus of 400Kpsi)
Parylene Deposition
Three stage vapor deposition process
PDS 2010
Parylene Deposition
Dep. Rate=0.5um/gram
Deposition rate of parylene C
Parylene Etching
- Low Temperature, low pressure and High Aspect Ratio
(HAR) Parylene etching using Inductively Coupled
Plasma (ICP) is developed
- High Aspect Ratio > 8:1
- Etching Recipes
Etch#
Etch Rate
(µm/min)
RF Bias
power(W)
Source
power(W)
O2(sccm)
Ar(sccm)
a
1.7
250
400
20
0
b
1.0
100
400
10
10
c
0.5
100
150
10
10
Scanning Electron Micrographs of
etched Parylene structures
A
B
Anisotropic profiles of (a) 55 µm and (b) 10 µm thick parylene
Scanning Electron Micrographs of etched
Parylene structures
Scanning Electron Micrographs of etched Parylene
structures
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